Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry
Tsuchiya, Yoshishige, Endoh, M, Kurosawa, M, Tung, R. T, Hattori, T and Oda, S (2002) Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry. At 2002 International Conference on Solid State Devices and Materials (SSDM2002), Nagoya, Tokyo, 17 - 19 Sep 2002.
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| Item Type: | Conference or Workshop Item (Poster) |
|---|---|
| Additional Information: | Event Dates: 17-19 September |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 267446 |
| Date Deposited: | 01 Jun 2009 15:17 |
| Last Modified: | 02 Mar 2012 14:05 |
| Contributors: | Tsuchiya, Yoshishige (Author) Endoh, M (Author) Kurosawa, M (Author) Tung, R. T (Author) Hattori, T (Author) Oda, S (Author) |
| Date: | 2002 |
| Additional Information: | Event Dates: 17-19 September |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/267446 |
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