Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry


Tsuchiya, Yoshishige, Endoh, M, Kurosawa, M, Tung, R. T, Hattori, T and Oda, S (2002) Atomic layer-by-layer MOCVD of high-k dielectric thin films with in-situ monitoring by spectroscopic ellipsometry. At 2002 International Conference on Solid State Devices and Materials (SSDM2002), Nagoya, Tokyo, 17 - 19 Sep 2002.

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Item Type: Conference or Workshop Item (Poster)
Additional Information: Event Dates: 17-19 September
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
ePrint ID: 267446
Date Deposited: 01 Jun 2009 15:17
Last Modified: 27 Mar 2014 20:13
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/267446

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