Synthesis of Assembled Nanocrystalline Si Dots Film by the Langmuir-Blodgett Technique
Tanaka, A, Tsuchiya, Y, Usami, K, Saito, S, Arai, T, Mizuta, H and Oda, S (2008) Synthesis of Assembled Nanocrystalline Si Dots Film by the Langmuir-Blodgett Technique. JAPANESE JOURNAL OF APPLIED PHYSICS, 47, 3731-3734.
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Description/Abstract
We report on a new bottom-up technique for forming silicon nanostructures based on the assembly of nanocrystalline Si (nc-Si) dots by the Langmuir-Blodgett technique. nc-Si dots with a diameter of 10 +/- 1 nm fabricated by a very high frequency (VHF) plasma process are dispersed in solvent and functionalized with an appropriate silane coupling agent. After compression at the surface of a Langmuir trough to form a well-organized two-dimensional array, nc-Si dots are transferred onto Si substrates. We have succeeded in forming a well-assembled nc-Si dot array with an area density of 7.33 x 10(11) cm(-2). Furthermore, we clarified what happens at the surface of a Langmuir trough based by analyzing surface pressure-area isotherms. [DOI: 10.1143/JJAP.47.3731]
| Item Type: | Article |
|---|---|
| Additional Information: | Imported from ISI Web of Science |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 269598 |
| Date Deposited: | 21 Apr 2010 07:46 |
| Last Modified: | 26 Apr 2013 04:50 |
| Contributors: | Tanaka, A (Author) Tsuchiya, Y (Author) Usami, K (Author) Saito, S (Author) Arai, T (Author) Mizuta, H (Author) Oda, S (Author) |
| Date: | 2008 |
| Additional Information: | Imported from ISI Web of Science |
| Status: | Unpublished |
| Further Information: | Google Scholar |
| ISI Citation Count: | 5 |
| URI: | http://eprints.soton.ac.uk/id/eprint/269598 |
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