High density p-type Bi/sub 0.5/Sb/sub 1.5/Te/sub 3/ nanowires by electrochemical templating through ion-track lithography


Koukharenko, E., Nandhakumar, I.S., Tudor, J., Beeby, S.P. and White, N.M. (2009) High density p-type Bi/sub 0.5/Sb/sub 1.5/Te/sub 3/ nanowires by electrochemical templating through ion-track lithography. Physical Chemistry Chemical Physics, 3584-90.

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Description/Abstract

High density p-type Bi/sub 0.5/Sb/sub 1.5/Te/sub 3/ nanowire arrays are produced by a combination of electrodeposition and ion-track lithography technology. Initially, the electrodeposition of p-type Bi/sub 0.5/Sb/sub 1.5/Te/sub 3/ films is investigated to find out the optimal conditions for the deposition of nanowires. Polyimide-based Kapton foils are chosen as a polymer for ion track irradiation and nanotemplating Bi/sub 0.5/Sb/sub 1.5/Te/sub 3/ nanowires. The obtained nanowires have average diameters of 80 nm and lengths of 20 mu m, which are equivalent to the pore size and thickness of Kapton foils. The nanowires exhibit a preferential orientation along the {110} plane with a composition of 11.26 at.% Bi, 26.23 at.% Sb, and 62.51 at.% Te. Temperature dependence studies of the electrical resistance show the semiconducting nature of the nanowires with a negative temperature coefficient of resistance and band gap energy of 0.089 +/- 0.006 eV.

Item Type: Article
Additional Information: Imported from ISI Web of Science
Divisions: Faculty of Physical and Applied Science > Electronics and Computer Science > EEE
Item ID: 270342
Date Deposited: 21 Apr 2010 07:46
Last Modified: 02 Mar 2012 12:42
Contributors: Koukharenko, E. (Author)
Nandhakumar, I.S. (Author)
Tudor, J. (Author)
Beeby, S.P. (Author)
White, N.M. (Author)
Date: 2009
Additional Information: Imported from ISI Web of Science
Status: Unpublished
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/270342

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