Suspended quantum dot fabrication on a heavily-doped silicon nanowire by suppressing unintentional quantum dot formation
Ogi, Jun, Ghiass, Mohammad Adel, Tsuchiya, Yoshishige, Uchida, K, Oda, S and Mizuta, Hiroshi (2010) Suspended quantum dot fabrication on a heavily-doped silicon nanowire by suppressing unintentional quantum dot formation. Jpn. J. Appl. Phys., 49, 044001.
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| Item Type: | Article |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 271017 |
| Date Deposited: | 06 May 2010 21:28 |
| Last Modified: | 24 Aug 2012 03:32 |
| Contributors: | Ogi, Jun (Author) Ghiass, Mohammad Adel (Author) Tsuchiya, Yoshishige (Author) Uchida, K (Author) Oda, S (Author) Mizuta, Hiroshi (Author) |
| Date: | 2010 |
| Status: | Published |
| Further Information: | Google Scholar |
| ISI Citation Count: | 2 |
| URI: | http://eprints.soton.ac.uk/id/eprint/271017 |
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