A comparative study of four thick photoresists for MEMS applications
Koukharenka, A, Kraft, Michael, Ensell, G and Hollinshead, N (2005) A comparative study of four thick photoresists for MEMS applications. Journal Material Science:Materials in Electronics, 16, (11-12), 741-747.
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| Item Type: | Article |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 271047 |
| Date Deposited: | 10 May 2010 13:53 |
| Last Modified: | 02 Mar 2012 14:05 |
| Contributors: | Koukharenka, A (Author) Kraft, Michael (Author) Ensell, G (Author) Hollinshead, N (Author) |
| Date: | 2005 |
| Status: | Published |
| Publisher: | Springer |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/271047 |
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