Ion track technology for nanolithography using thick cross-linked PMMA 950 photoresist
Koukharenko, Elena , Kuleshova , Jekaterina , Fowler, Marcel, Kok, Stephen, Tudor, MJ, Beeby, SP, Nandhakumar , Iris and White, NM (2010) Ion track technology for nanolithography using thick cross-linked PMMA 950 photoresist. Japanese Journal of Applied Physics , 49, (6)
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| Item Type: | Article |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > EEE |
| Item ID: | 271181 |
| Date Deposited: | 26 May 2010 15:20 |
| Last Modified: | 02 Mar 2012 12:42 |
| Contributors: | Koukharenko, Elena (Author) Kuleshova , Jekaterina (Author) Fowler, Marcel (Author) Kok, Stephen (Author) Tudor, MJ (Author) Beeby, SP (Author) Nandhakumar , Iris (Author) White, NM (Author) |
| Date: | 2010 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/271181 |
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