Ion Track Nanolithography for Nanotemplate Fabrication using Thick Cross-Linked PMMA 950 Photoresist
Koukharenko, Elena, Kuleshova, J, Kok, S, Tudor, MJ, O'Connell, D, Pike, J, Beeby, SP, Nandhakumar , I and White, NM (2009) Ion Track Nanolithography for Nanotemplate Fabrication using Thick Cross-Linked PMMA 950 Photoresist. In, 22nd International Microprocesses and Nanotechnology Conference , Sapporo, Japan, 16 - 19 Nov 2009. , 186-187.
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| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Additional Information: | Event Dates: November 16-19 |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > EEE |
| Item ID: | 271199 |
| Date Deposited: | 28 May 2010 09:12 |
| Last Modified: | 02 Mar 2012 13:22 |
| Contributors: | Koukharenko, Elena (Author) Kuleshova, J (Author) Kok, S (Author) Tudor, MJ (Author) O'Connell, D (Author) Pike, J (Author) Beeby, SP (Author) Nandhakumar , I (Author) White, NM (Author) |
| Date: | 2009 |
| Additional Information: | Event Dates: November 16-19 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/271199 |
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