Comparative study of different thick photoresists for MEMS applications Journal of Materials Science: Materials in Electronics 16 pp. 741– 747


Koukharenko, Elena, Kraft, M, Ensell, G and Hollinshead, N (2005) Comparative study of different thick photoresists for MEMS applications Journal of Materials Science: Materials in Electronics 16 pp. 741– 747. Comparative study of different thick photoresists for MEMS applications Journal of Materials Science: Materials in Electronics , 16, 741-747.

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Item Type: Article
Divisions: Faculty of Physical Sciences and Engineering > Electronics and Computer Science > NANO
Faculty of Physical Sciences and Engineering > Electronics and Computer Science > EEE
ePrint ID: 271725
Date Deposited: 30 Nov 2010 15:20
Last Modified: 27 Mar 2014 20:17
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/271725

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