Comparative study of different thick photoresists for MEMS applications Journal of Materials Science: Materials in Electronics 16 pp. 741– 747
Koukharenko, Elena, Kraft, M, Ensell, G and Hollinshead, N (2005) Comparative study of different thick photoresists for MEMS applications Journal of Materials Science: Materials in Electronics 16 pp. 741– 747. Comparative study of different thick photoresists for MEMS applications Journal of Materials Science: Materials in Electronics , 16, 741-747.
Download
Full text not available from this repository.
| Item Type: | Article |
|---|---|
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO Faculty of Physical and Applied Science > Electronics and Computer Science > EEE |
| Item ID: | 271725 |
| Date Deposited: | 30 Nov 2010 15:20 |
| Last Modified: | 02 Mar 2012 11:41 |
| Contributors: | Koukharenko, Elena (Author) Kraft, M (Author) Ensell, G (Author) Hollinshead, N (Author) |
| Date: | 2005 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/271725 |
Actions (login required)
 |
View Item |
