Magneto-resistance in a lithography defined single constrained domain wall spin valve
Wang, Yudong, Claudio-Gonzalez, D., Fangohr, H. and De Groot, Kees (2010) Magneto-resistance in a lithography defined single constrained domain wall spin valve. Applied Physics Letters, 97, 262501-262503. (doi:10.1063/1.3531666).
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Description/Abstract
We have measured domain wall magnetoresistance in a single lithographically constrained domain wall. An H-shaped Ni nano-bridge was fabricated by e-beam lithography with the two sides being single magnetic do- mains showing independent magnetic switching. The connection between the sides constraining the domain wall when the sides line up anti-parallel. The magneto-resistance curve clearly identifies the magnetic con- figurations that are expected from a spin valve-like structure. The value of the magneto-resistance at room temperature is around 0.1% or 0.4 . This value is shown to be in agreement with a theoretical formulation based on spin accumulation. Micromagnetic simulations show it is possible to reduce the size of the domain wall further by shortening the length of the bridge.
| Item Type: | Article |
|---|---|
| ISSNs: | 0003-6951 (print) 0003-6951 (electronic) |
| Related URLs: | |
| Subjects: | Q Science > QC Physics |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 271789 |
| Date Deposited: | 15 Dec 2010 11:26 |
| Last Modified: | 14 Mar 2013 13:16 |
| Contributors: | Wang, Yudong (Author) Claudio-Gonzalez, D. (Author) Fangohr, H. (Author) De Groot, Kees (Author) |
| Date: | December 2010 |
| Status: | Published |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/271789 |
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