Electrodeposited Ni/Ge contacts for limiting leakage currents in Schottky barrier MOSFETs


Husain, Muhammad, Li, Xiaoli and De Groot, Kees (2009) Electrodeposited Ni/Ge contacts for limiting leakage currents in Schottky barrier MOSFETs. At International Semiconductor Device Research Symposium, University of Maryland, College Park, MD, USA, 09 - 11 Dec 2009.

Download

[img] PDF
Download (197Kb)
Item Type: Conference or Workshop Item (Speech)
Additional Information: Event Dates: December 9-11, 2009
Divisions: Faculty of Physical and Applied Science > Electronics and Computer Science > NANO
Item ID: 272685
Date Deposited: 19 Aug 2011 11:22
Last Modified: 01 Mar 2012 12:14
Contributors: Husain, Muhammad (Author)
Li, Xiaoli (Author)
De Groot, Kees (Author)
Date: 2009
Additional Information: Event Dates: December 9-11, 2009
Status: Published
Further Information:Google Scholar
URI: http://eprints.soton.ac.uk/id/eprint/272685

Actions (login required)

View Item View Item