Nanoimprint lithography for planar chiral photonic meta-materials
Nanoimprint lithography for planar chiral photonic meta-materials
Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ) was applied. The polarization conversion capabilities of planar chiral structures imprinted in dielectric materials have experimentally been observed. This indicates that the developed processes in this work have the prospect of manufacturing planar photonic meta media in high volume at low cost.
room temperature nanoimprint lithography, electron beam lithography, reactive ion etch, planar chiral structures, optical activity, lor, pmma, hydrogen silsequioxane
612-617
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Tao, Jiarui
ce6f40bf-1766-4628-9a19-a4c915f8efd8
Zhao, Xinghong
484d6b71-f975-4336-8f20-25395b53b040
Cui, Zheng
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Schwanecke, Alexander S.
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Zheludev, Nikolay I.
32fb6af7-97e4-4d11-bca6-805745e40cc6
11 January 2005
Chen, Yifang
fb868aa4-ecb4-4203-a0a8-88c2195a2bae
Tao, Jiarui
ce6f40bf-1766-4628-9a19-a4c915f8efd8
Zhao, Xinghong
484d6b71-f975-4336-8f20-25395b53b040
Cui, Zheng
b0127743-2b0d-4fd7-a383-fa6ed3ccff59
Schwanecke, Alexander S.
2f6c06ac-00e6-4e9f-ae02-ba851d99e7f5
Zheludev, Nikolay I.
32fb6af7-97e4-4d11-bca6-805745e40cc6
Chen, Yifang, Tao, Jiarui, Zhao, Xinghong, Cui, Zheng, Schwanecke, Alexander S. and Zheludev, Nikolay I.
(2005)
Nanoimprint lithography for planar chiral photonic meta-materials.
Microelectronic Engineering, 78-79, .
(doi:10.1016/j.mee.2004.12.078).
Abstract
Room temperature nanoimprint lithography has successfully been applied to the fabrication of planar chiral photonic meta-materials. For dielectric chiral structures a single layer of thick HSQ was used while for metallic chiral structures a bi-layer technique using PMMA/hydrogen silsequioxane (HSQ) was applied. The polarization conversion capabilities of planar chiral structures imprinted in dielectric materials have experimentally been observed. This indicates that the developed processes in this work have the prospect of manufacturing planar photonic meta media in high volume at low cost.
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Published date: 11 January 2005
Keywords:
room temperature nanoimprint lithography, electron beam lithography, reactive ion etch, planar chiral structures, optical activity, lor, pmma, hydrogen silsequioxane
Identifiers
Local EPrints ID: 28739
URI: http://eprints.soton.ac.uk/id/eprint/28739
ISSN: 0167-9317
PURE UUID: 9f5e0457-6f1f-4bac-90b6-b8eab9b6f602
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Date deposited: 05 May 2006
Last modified: 16 Mar 2024 02:43
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Contributors
Author:
Yifang Chen
Author:
Jiarui Tao
Author:
Xinghong Zhao
Author:
Zheng Cui
Author:
Alexander S. Schwanecke
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