Large area plasma-enhanced chemical vapor deposition of nanocrystalline graphite on insulator for electronic device application
Schmidt, Marek E., Xu, Cigang, Cooke, Mike, Mizuta, Hiroshi and Chong, H.M.H. (2012) Large area plasma-enhanced chemical vapor deposition of nanocrystalline graphite on insulator for electronic device application. At Graphene 2012, Brussels, BE, 10 - 13 Apr 2012. (Submitted).
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Description/Abstract
This paper reports on large area plasma-enhanced chemical vapor deposition (PECVD) of nanocrystalline graphite (NCG) on thermally grown SiO2 wafer, quartz and sapphire substrates. Grown films are evaluated using Raman spectroscopy, ellipsometry, scanning electron microscopy (SEM) and atomic force microscopy (AFM). Electrical characterization and optical transmission measurements
indicate promising properties of this material for use as transparent electrodes and for electronic device application. A plasma-based etch process for NCG has been developed.
| Item Type: | Conference or Workshop Item (Speech) |
|---|---|
| Related URLs: | |
| Subjects: | Q Science > QA Mathematics > QA75 Electronic computers. Computer science T Technology > TP Chemical technology |
| Divisions: | Faculty of Physical and Applied Science > Electronics and Computer Science > NANO |
| Item ID: | 335890 |
| Date Deposited: | 14 Mar 2012 11:46 |
| Last Modified: | 01 May 2012 10:58 |
| Contributors: | Schmidt, Marek E. (Author) Xu, Cigang (Author) Cooke, Mike (Author) Mizuta, Hiroshi (Author) Chong, H.M.H. (Author) |
| Date: | March 2012 |
| Status: | Submitted |
| Further Information: | Google Scholar |
| URI: | http://eprints.soton.ac.uk/id/eprint/335890 |
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