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Analysis, quantification, and mitigation of electrical variability due to layout dependent effects in SOC designs

Analysis, quantification, and mitigation of electrical variability due to layout dependent effects in SOC designs
Analysis, quantification, and mitigation of electrical variability due to layout dependent effects in SOC designs
Variability in performance and power of 40nm and 28nm CMOS cells is highly dependent on the context in which the cells are used. In this study, the effects of context on a number of clock tree cells from standard cell libraries have been investigated. The study also demonstrated how the Litho Electrical Analyzer (LEA) tool from Cadence is used to analyze the context-dependent variability. During the study, it was observed that the device characteristics including Vth, Idsat, and Ioff are significantly affected by Layout Dependent Effects (LDE), resulting in variability of performance and power of standard cells. Moreover, the dummy diffusions acting as mitigation process offered limited improvement for the effects of context. On the other hand, the cell level variability due to stress was analyzed. So, it is suggested that the relative variability of a cell is determined by its size and structure, and the variability can be improved to some extent by editing the cells' structure. Based on the analysis of the physical sources and properties of LDE, this paper presents a set of layout guidelines for mitigating layout dependent variability of 40 and 28nm CMOS cells
83270F
SPIE - The International Society for Optical Engineering
Wang, Yangang
84511804-36d1-44c7-90d4-a18201735a08
Zwolinski, Mark
adfcb8e7-877f-4bd7-9b55-7553b6cb3ea0
Appleby, Andrew
ebb63f5c-dce0-470f-9753-1ffd9f37f95e
Scoones, Mark
48700f9c-e139-4043-a6fc-38bbe0185aa6
Caldwell, Sonia
aecc7838-001e-4b51-8ece-dab3d6b91a62
Azam, Touqeer
624d84ab-3a51-40af-9962-d331b6235ca2
Hurat, Philippe
d10ef70f-904c-4a5e-8d73-2a6f2db4dc51
Pitchford, Chris
706b5444-3f66-4cdb-bc3e-0ec20988d414
Mason, Mark E.
Wang, Yangang
84511804-36d1-44c7-90d4-a18201735a08
Zwolinski, Mark
adfcb8e7-877f-4bd7-9b55-7553b6cb3ea0
Appleby, Andrew
ebb63f5c-dce0-470f-9753-1ffd9f37f95e
Scoones, Mark
48700f9c-e139-4043-a6fc-38bbe0185aa6
Caldwell, Sonia
aecc7838-001e-4b51-8ece-dab3d6b91a62
Azam, Touqeer
624d84ab-3a51-40af-9962-d331b6235ca2
Hurat, Philippe
d10ef70f-904c-4a5e-8d73-2a6f2db4dc51
Pitchford, Chris
706b5444-3f66-4cdb-bc3e-0ec20988d414
Mason, Mark E.

Wang, Yangang, Zwolinski, Mark, Appleby, Andrew, Scoones, Mark, Caldwell, Sonia, Azam, Touqeer, Hurat, Philippe and Pitchford, Chris (2012) Analysis, quantification, and mitigation of electrical variability due to layout dependent effects in SOC designs. Mason, Mark E. (ed.) In Design for Manufacturability through Design-Process Integration VI. vol. 8327, SPIE - The International Society for Optical Engineering. 83270F . (doi:10.1117/12.916458).

Record type: Conference or Workshop Item (Paper)

Abstract

Variability in performance and power of 40nm and 28nm CMOS cells is highly dependent on the context in which the cells are used. In this study, the effects of context on a number of clock tree cells from standard cell libraries have been investigated. The study also demonstrated how the Litho Electrical Analyzer (LEA) tool from Cadence is used to analyze the context-dependent variability. During the study, it was observed that the device characteristics including Vth, Idsat, and Ioff are significantly affected by Layout Dependent Effects (LDE), resulting in variability of performance and power of standard cells. Moreover, the dummy diffusions acting as mitigation process offered limited improvement for the effects of context. On the other hand, the cell level variability due to stress was analyzed. So, it is suggested that the relative variability of a cell is determined by its size and structure, and the variability can be improved to some extent by editing the cells' structure. Based on the analysis of the physical sources and properties of LDE, this paper presents a set of layout guidelines for mitigating layout dependent variability of 40 and 28nm CMOS cells

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More information

Published date: March 2012
Venue - Dates: Design for Manufacturability through Design-Process Integration VI, San Jose, United States, 2012-03-01
Organisations: Electronic & Software Systems

Identifiers

Local EPrints ID: 339230
URI: http://eprints.soton.ac.uk/id/eprint/339230
PURE UUID: e798adaa-e1a5-4034-ac7e-64773291d30b
ORCID for Mark Zwolinski: ORCID iD orcid.org/0000-0002-2230-625X

Catalogue record

Date deposited: 25 May 2012 13:58
Last modified: 15 Mar 2024 02:39

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Contributors

Author: Yangang Wang
Author: Mark Zwolinski ORCID iD
Author: Andrew Appleby
Author: Mark Scoones
Author: Sonia Caldwell
Author: Touqeer Azam
Author: Philippe Hurat
Author: Chris Pitchford
Editor: Mark E. Mason

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