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Design and fabrication of a quasi-ordered nanoporous silicon membrane suitable for thermally induced drug release

Design and fabrication of a quasi-ordered nanoporous silicon membrane suitable for thermally induced drug release
Design and fabrication of a quasi-ordered nanoporous silicon membrane suitable for thermally induced drug release
The design and fabrication of an ordered nanoporous silicon membrane and integrated heater and temperature sensor is described. The methodology for fabrication of the nanoporous structure has been developed for integration within microelectromechanical systems. The structure is fabricated from a 500 µm thick silicon (1 0 0) wafer, which has been etched to provide 4 × 4 mm2 membranes of 50 µm thick. Quasi-ordered nanoporous silicon is created within the membrane, the nanopores are of uniform diameter (typical structures of the order of 105 ±5 nm) and smooth sidewalls to a depth of ~300 nm, in a hexagonal close-packed pattern of 200 nm nearest neighbour. The porosity of typical fabricated samples is 31.5%. On the back side of the membrane, a heater and a temperature sensor are incorporated. Three different heater/temperature sensor designs were considered theoretically and the best design was then fabricated and studied experimentally. The results obtained provide both highly ordered nanoporous silicon fabrication methodology as well as evidence that the porous membrane can be heated without deleterious effect.
0960-1317
85028
Chau, Chien Fat
b49f2cd5-29a7-4c20-b87e-35600a7a6cfd
Melvin, Tracy
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f
Chau, Chien Fat
b49f2cd5-29a7-4c20-b87e-35600a7a6cfd
Melvin, Tracy
fd87f5eb-2bb9-48fa-b7be-7100ace9c50f

Chau, Chien Fat and Melvin, Tracy (2012) Design and fabrication of a quasi-ordered nanoporous silicon membrane suitable for thermally induced drug release. Journal of Micromechanics and Microengineering, 22 (8), 85028. (doi:10.1088/0960-1317/22/8/085028).

Record type: Article

Abstract

The design and fabrication of an ordered nanoporous silicon membrane and integrated heater and temperature sensor is described. The methodology for fabrication of the nanoporous structure has been developed for integration within microelectromechanical systems. The structure is fabricated from a 500 µm thick silicon (1 0 0) wafer, which has been etched to provide 4 × 4 mm2 membranes of 50 µm thick. Quasi-ordered nanoporous silicon is created within the membrane, the nanopores are of uniform diameter (typical structures of the order of 105 ±5 nm) and smooth sidewalls to a depth of ~300 nm, in a hexagonal close-packed pattern of 200 nm nearest neighbour. The porosity of typical fabricated samples is 31.5%. On the back side of the membrane, a heater and a temperature sensor are incorporated. Three different heater/temperature sensor designs were considered theoretically and the best design was then fabricated and studied experimentally. The results obtained provide both highly ordered nanoporous silicon fabrication methodology as well as evidence that the porous membrane can be heated without deleterious effect.

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More information

Published date: August 2012
Organisations: Optoelectronics Research Centre, Electronics & Computer Science

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Local EPrints ID: 341462
URI: http://eprints.soton.ac.uk/id/eprint/341462
ISSN: 0960-1317
PURE UUID: a9d48092-7ecf-4265-b574-9e388e9cb0e6

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Date deposited: 27 Jul 2012 08:42
Last modified: 14 Mar 2024 11:40

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Contributors

Author: Chien Fat Chau
Author: Tracy Melvin

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