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High throughput physical vapour deposition and dielectric and ferroelectric screening of (Bi,Na)TiO3 thin-film libraries

High throughput physical vapour deposition and dielectric and ferroelectric screening of (Bi,Na)TiO3 thin-film libraries
High throughput physical vapour deposition and dielectric and ferroelectric screening of (Bi,Na)TiO3 thin-film libraries
0021-8979
014104-[5 pages]
Darby, Mark S. B.
d5936310-6ac2-45ad-b53e-f23195e8e8d3
Guerin, Samuel
e185e0c2-85c6-4d1c-a2cf-cd2f410d346f
Hayden, Brian E.
aea74f68-2264-4487-9d84-5b12ddbbb331
Schreiner, Hans-Jürgen
a2898e7d-7429-453f-9ba3-0f862ebfdb94
Yakovlev, Sergey
5ab8a9ff-1c7b-4f01-b6bd-51320030cf88
Darby, Mark S. B.
d5936310-6ac2-45ad-b53e-f23195e8e8d3
Guerin, Samuel
e185e0c2-85c6-4d1c-a2cf-cd2f410d346f
Hayden, Brian E.
aea74f68-2264-4487-9d84-5b12ddbbb331
Schreiner, Hans-Jürgen
a2898e7d-7429-453f-9ba3-0f862ebfdb94
Yakovlev, Sergey
5ab8a9ff-1c7b-4f01-b6bd-51320030cf88

Darby, Mark S. B., Guerin, Samuel, Hayden, Brian E., Schreiner, Hans-Jürgen and Yakovlev, Sergey (2013) High throughput physical vapour deposition and dielectric and ferroelectric screening of (Bi,Na)TiO3 thin-film libraries. Journal of Applied Physics, 113 (1), 014104-[5 pages]. (doi:10.1063/1.4773101).

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Published date: 2013
Related URLs:
Organisations: Electrochemistry

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Local EPrints ID: 353156
URI: http://eprints.soton.ac.uk/id/eprint/353156
DOI: doi:10.1063/1.4773101
ISSN: 0021-8979
PURE UUID: 923b2969-389e-494e-a8ad-97d8f9959247
ORCID for Brian E. Hayden: ORCID iD orcid.org/0000-0002-7762-1812

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Date deposited: 03 Jun 2013 10:58
Last modified: 15 Mar 2024 02:36

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Contributors

Author: Mark S. B. Darby
Author: Samuel Guerin
Author: Brian E. Hayden ORCID iD
Author: Hans-Jürgen Schreiner
Author: Sergey Yakovlev

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