Kiang, Kian Shen, Kalsi, Sumit, Ritter, Daniel, Unal, Nezih, Morgan, Hywel, Anteney, Iain, Chong, Harold M. H. and de Planque, Maurits R.R. (2013) Fabrication of tapered edgewall apertures using grayscale lithography. 39th International Conference on Micro and Nano Engineering, , London, United Kingdom. 16 - 19 Sep 2013.
Record type:
Conference or Workshop Item
(Poster)
This record has no associated files available for download.
More information
e-pub ahead of print date: 18 September 2013
Venue - Dates:
39th International Conference on Micro and Nano Engineering, , London, United Kingdom, 2013-09-16 - 2013-09-19
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 354186
URI: http://eprints.soton.ac.uk/id/eprint/354186
PURE UUID: 242e38f9-a3cf-44b9-950d-38b822c6d0e4
Catalogue record
Date deposited: 10 Jul 2013 15:11
Last modified: 11 Dec 2021 04:18
Export record
Contributors
Author:
Sumit Kalsi
Author:
Daniel Ritter
Author:
Nezih Unal
Author:
Hywel Morgan
Author:
Iain Anteney
Author:
Harold M. H. Chong
Author:
Maurits R.R. de Planque
Download statistics
Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.