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Rapid laser-based micro/nano-manufacturing using digital multimirror device technology

Rapid laser-based micro/nano-manufacturing using digital multimirror device technology
Rapid laser-based micro/nano-manufacturing using digital multimirror device technology
Single pulses from an ultrafast laser, in combination with a Texas Instrument’s digital multimirror device, have been used to spatially pattern complex structures via laser-ablation, with sub-micron-scale resolution. This flexible and novel manufacturing technique has the ability to pattern (via additive and subtractive fabrication) up to ~1cm2 regions with sub-micron resolution on the time scale of hours, hence finding applications in fields as diverse as metamaterials, telecommunications and semiconductor technologies.
There exists a wide range of techniques for the fabrication of micro-scale complex structures, including electron beam lithography, focused-ion beam milling, and direct laser. Whilst these techniques undoubtedly provide impressive resolution, these approaches are not so useful for the manufacturing of larger-scale (~1mm to 1cm) devices, due to the significant time scales that are generally required.
Mills, B.
05f1886e-96ef-420f-b856-4115f4ab36d0
Feinäugle, Matthias
3b15dc5b-ff52-4232-9632-b1be238a750c
Gholipour, B.
c17bd62d-9df6-40e6-bc42-65272d97e559
Grant-Jacob, James
c5d144d8-3c43-4195-8e80-edd96bfda91b
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Mills, B.
05f1886e-96ef-420f-b856-4115f4ab36d0
Feinäugle, Matthias
3b15dc5b-ff52-4232-9632-b1be238a750c
Gholipour, B.
c17bd62d-9df6-40e6-bc42-65272d97e559
Grant-Jacob, James
c5d144d8-3c43-4195-8e80-edd96bfda91b
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020

Mills, B., Feinäugle, Matthias, Gholipour, B., Grant-Jacob, James and Eason, R.W. (2013) Rapid laser-based micro/nano-manufacturing using digital multimirror device technology. UKMTFC 2013 (2nd Annual EPSRC Manufacturing the Future Conference), Cranfield, United Kingdom. 16 - 17 Sep 2013.

Record type: Conference or Workshop Item (Paper)

Abstract

Single pulses from an ultrafast laser, in combination with a Texas Instrument’s digital multimirror device, have been used to spatially pattern complex structures via laser-ablation, with sub-micron-scale resolution. This flexible and novel manufacturing technique has the ability to pattern (via additive and subtractive fabrication) up to ~1cm2 regions with sub-micron resolution on the time scale of hours, hence finding applications in fields as diverse as metamaterials, telecommunications and semiconductor technologies.
There exists a wide range of techniques for the fabrication of micro-scale complex structures, including electron beam lithography, focused-ion beam milling, and direct laser. Whilst these techniques undoubtedly provide impressive resolution, these approaches are not so useful for the manufacturing of larger-scale (~1mm to 1cm) devices, due to the significant time scales that are generally required.

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More information

e-pub ahead of print date: 2013
Venue - Dates: UKMTFC 2013 (2nd Annual EPSRC Manufacturing the Future Conference), Cranfield, United Kingdom, 2013-09-16 - 2013-09-17
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 365187
URI: http://eprints.soton.ac.uk/id/eprint/365187
PURE UUID: f1d89fb8-79c9-4994-bcc8-45fc05fc316d
ORCID for B. Mills: ORCID iD orcid.org/0000-0002-1784-1012
ORCID for James Grant-Jacob: ORCID iD orcid.org/0000-0002-4270-4247
ORCID for R.W. Eason: ORCID iD orcid.org/0000-0001-9704-2204

Catalogue record

Date deposited: 27 May 2014 13:06
Last modified: 12 Dec 2021 03:36

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Contributors

Author: B. Mills ORCID iD
Author: Matthias Feinäugle
Author: B. Gholipour
Author: R.W. Eason ORCID iD

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