Suspended SOI waveguide with sub-wavelength grating cladding for mid-infrared
Suspended SOI waveguide with sub-wavelength grating cladding for mid-infrared
We present a new type of mid-infrared silicon-on-insulator (SOI) waveguide. The waveguide comprises a sub-wavelength lattice of holes acting as lateral cladding while at the same time allowing for the bottom oxide (BOX) removal by etching. The waveguide loss is determined at the wavelength of 3.8 µm for structures before and after being underetched using both vapor phase and liquid hydrofluoric acid (HF). A propagation loss of 3.4 dB/cm was measured for a design with a 300 nm grating period and 150 nm holes after partial removal (560 nm) of BOX by vapor phase HF etching. We also demonstrate an alternative design with 550 nm period and 450 nm holes, which allows a faster and complete removal of the BOX by liquid phase HF etching, yielding the waveguide propagation loss of 3.6 dB/cm.
5661-5664
Soler Penadés, J.
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Alonso-Ramos, C.
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Khokhar, A.Z.
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Nedeljković, M.
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Boodhoo, L.A.
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Ortega-Moñux, A.
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Molina-Fernández, I.
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Cheben, P.
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Mashanovich, G.Z.
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25 September 2014
Soler Penadés, J.
f18f3619-0d71-4547-95fd-dd38c37b7adb
Alonso-Ramos, C.
81ef371b-5744-490d-bdf3-5c840a996901
Khokhar, A.Z.
2eedd1cc-8ac5-4f8e-be25-930bd3eae396
Nedeljković, M.
b64e21c2-1b95-479d-a35c-3456dff8c796
Boodhoo, L.A.
3de861fb-137e-487d-bff0-45bbd466a223
Ortega-Moñux, A.
1ddc0007-ad93-424f-909e-1891ebd4973e
Molina-Fernández, I.
9a123b9e-a12a-417e-b35d-f55d589af32b
Cheben, P.
9a2e25a5-6aa0-414e-a061-23416efedebc
Mashanovich, G.Z.
c806e262-af80-4836-b96f-319425060051
Soler Penadés, J., Alonso-Ramos, C., Khokhar, A.Z., Nedeljković, M., Boodhoo, L.A., Ortega-Moñux, A., Molina-Fernández, I., Cheben, P. and Mashanovich, G.Z.
(2014)
Suspended SOI waveguide with sub-wavelength grating cladding for mid-infrared.
Optics Letters, 39 (19), .
(doi:10.1364/OL.39.005661).
Abstract
We present a new type of mid-infrared silicon-on-insulator (SOI) waveguide. The waveguide comprises a sub-wavelength lattice of holes acting as lateral cladding while at the same time allowing for the bottom oxide (BOX) removal by etching. The waveguide loss is determined at the wavelength of 3.8 µm for structures before and after being underetched using both vapor phase and liquid hydrofluoric acid (HF). A propagation loss of 3.4 dB/cm was measured for a design with a 300 nm grating period and 150 nm holes after partial removal (560 nm) of BOX by vapor phase HF etching. We also demonstrate an alternative design with 550 nm period and 450 nm holes, which allows a faster and complete removal of the BOX by liquid phase HF etching, yielding the waveguide propagation loss of 3.6 dB/cm.
Text
SubWav%20Final%20version.pdf
- Author's Original
More information
Accepted/In Press date: 26 July 2014
e-pub ahead of print date: 29 August 2014
Published date: 25 September 2014
Organisations:
Optoelectronics Research Centre, Photonic Systems Circuits & Sensors
Identifiers
Local EPrints ID: 378512
URI: http://eprints.soton.ac.uk/id/eprint/378512
ISSN: 0146-9592
PURE UUID: 0bfa7659-28cf-4574-af41-da4bbd76a28f
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Date deposited: 30 Jun 2015 13:44
Last modified: 15 Mar 2024 03:50
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Contributors
Author:
J. Soler Penadés
Author:
C. Alonso-Ramos
Author:
A.Z. Khokhar
Author:
L.A. Boodhoo
Author:
A. Ortega-Moñux
Author:
I. Molina-Fernández
Author:
P. Cheben
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