A silicon structure for electrical characterisation of nanoscale elements

Sazio, P.J.A., Berg, J., See, P., Ford, C.J.B., Lundgren, P., Greenham, N.C., Ginger, D.S., Bengtsson, S. and Chin, S.N. (2001) A silicon structure for electrical characterisation of nanoscale elements. In, Materials Research Society Symposium Proceedings. 2001 MRS Spring Meeting USA, Materials Research Society.


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The problem of mass manufacturing electrode structures suitable for contacting nanoscale elements lies primarily in the difficulty of fabricating a nanometre-scale gap between two electrodes in a well controlled, highly parallel manner. In ULSI circuit production, the gate and substrate in MOSFETs are routinely fabricated with a precise vertical spacing of 3 nm between them.

In this work, we have investigated a number of highly parallel methods for the generation of nanogaps, including reconfiguration of the ubiquitous MOS device structure. The silicon dioxide layer that provides vertical separation and electrical insulation between two regions of silicon (the crystalline substrate and the poly-crystalline gate) gives a leakage current of 1 nA ?m. In the future this kind of device has the potential to provide a bolt-on technology for the fabrication of ULSI circuits in which conventional CMOS devices are directly hybridised with functional nanoscale elements.

Item Type: Book Section
Additional Information: Symposium B: Molecular and Biomolecular Electronics. Paper: B2.3
Related URLs:
Subjects: T Technology > TS Manufactures
T Technology > TK Electrical engineering. Electronics Nuclear engineering
Q Science > QC Physics
Divisions: University Structure - Pre August 2011 > Optoelectronics Research Centre
ePrint ID: 38969
Date :
Date Event
April 2001Published
Date Deposited: 20 Jun 2006
Last Modified: 31 Mar 2016 12:08
URI: http://eprints.soton.ac.uk/id/eprint/38969

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