Electrochemical 4-chlorophenol sensing properties of plasma-treated multilayer graphene modified photolithography patterned platinum electrode
Electrochemical 4-chlorophenol sensing properties of plasma-treated multilayer graphene modified photolithography patterned platinum electrode
The present work describes the electrochemical 4-chlorophenol (4-CP) sensing properties of multilayer graphene samples (MLG). In order to enhance the presence of oxygen functional groups and to increase the edge plane defects, oxygen plasma treatment is adopted. Raman, X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and atomic force microscopy (AFM) characterizations are used to investigate the effect of plasma treatment on MLG. Compared to pristine MLG, the oxygen plasma treated one shows increased oxidation current towards 4-CP. The sensor data exhibit high sensitivity and stability with high anti-interference property in the presence of other phenolic compounds including phenol, bisphenol, 2,3-chlorophenol, 2,3,4-nitrophenol and inorganic ions.
105920-105929
Kannan, Padmanathan Karthick
4887e8ff-3762-4c7f-89de-73e9161345d7
Gelamo, Rogerio V.
23692223-03b1-4b2d-9b7f-f02e26bccfa9
Morgan, Hywel
de00d59f-a5a2-48c4-a99a-1d5dd7854174
Palaniswamy, Suresh
67028373-feb7-4c25-95df-6d9327c2b743
Rout, Chandra Sekhar
23f0ffa1-313d-4d39-942c-acf1ec5ea3a3
2016
Kannan, Padmanathan Karthick
4887e8ff-3762-4c7f-89de-73e9161345d7
Gelamo, Rogerio V.
23692223-03b1-4b2d-9b7f-f02e26bccfa9
Morgan, Hywel
de00d59f-a5a2-48c4-a99a-1d5dd7854174
Palaniswamy, Suresh
67028373-feb7-4c25-95df-6d9327c2b743
Rout, Chandra Sekhar
23f0ffa1-313d-4d39-942c-acf1ec5ea3a3
Kannan, Padmanathan Karthick, Gelamo, Rogerio V., Morgan, Hywel, Palaniswamy, Suresh and Rout, Chandra Sekhar
(2016)
Electrochemical 4-chlorophenol sensing properties of plasma-treated multilayer graphene modified photolithography patterned platinum electrode.
RSC Advances, 6, .
(doi:10.1039/C6RA24136K).
Abstract
The present work describes the electrochemical 4-chlorophenol (4-CP) sensing properties of multilayer graphene samples (MLG). In order to enhance the presence of oxygen functional groups and to increase the edge plane defects, oxygen plasma treatment is adopted. Raman, X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and atomic force microscopy (AFM) characterizations are used to investigate the effect of plasma treatment on MLG. Compared to pristine MLG, the oxygen plasma treated one shows increased oxidation current towards 4-CP. The sensor data exhibit high sensitivity and stability with high anti-interference property in the presence of other phenolic compounds including phenol, bisphenol, 2,3-chlorophenol, 2,3,4-nitrophenol and inorganic ions.
Text
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Accepted/In Press date: 21 October 2016
e-pub ahead of print date: 31 October 2016
Published date: 2016
Organisations:
Nanoelectronics and Nanotechnology
Identifiers
Local EPrints ID: 401971
URI: http://eprints.soton.ac.uk/id/eprint/401971
ISSN: 2046-2069
PURE UUID: d7f861ec-920c-411e-8eaa-dc544f39ab51
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Date deposited: 26 Oct 2016 12:12
Last modified: 15 Mar 2024 06:00
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Contributors
Author:
Padmanathan Karthick Kannan
Author:
Rogerio V. Gelamo
Author:
Hywel Morgan
Author:
Suresh Palaniswamy
Author:
Chandra Sekhar Rout
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