Direct UV writing of channel waveguides and Bragg grating structures
Emmerson, G.D., Gawith, C.B.E., Williams, R.B. and Smith, P.G.R. (2003) Direct UV writing of channel waveguides and Bragg grating structures. In, Rank Prize Funds Minisymposium: Passive Optical Components, Grasmere, UK, 16 - 19 Jun 2003. 1pp.
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Description/Abstract
Direct UV writing is a dynamic planar lightwave circuit fabrication technique offering great potential as a means of rapid prototyping and small/medium batch fabrication. The technique is based on the refractive index increase of photosensitive glasses through exposure to ultraviolet light. In this case, a beam is tightly focused to create a writing spot in the order of microns and is translated relative to the sample. It is this translation over a 2-d plane that defines the channel waveguide structures; there is no need for a photolithographic mask or subsequent processing. This process has previously been shown to be a versatile system producing good quality, low loss waveguides compatible with existing silica based telecom fibres.
| Item Type: | Conference or Workshop Item (Paper) |
|---|---|
| Additional Information: | Winner of best presentation award |
| Related URLs: | |
| Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering Q Science > QC Physics |
| Divisions: | University Structure - Pre August 2011 > Optoelectronics Research Centre |
| Item ID: | 41598 |
| Date Deposited: | 05 Oct 2006 |
| Last Modified: | 28 Jun 2012 10:38 |
| Contributors: | Emmerson, G.D. (Author) Gawith, C.B.E. (Author) Williams, R.B. (Author) Smith, P.G.R. (Author) |
| Date: | 2003 |
| Additional Information: | Winner of best presentation award |
| Status: | Published |
| URI: | http://eprints.soton.ac.uk/id/eprint/41598 |
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