Fabrication of a single mode laser by UV-writing in neodymium doped silica-on-silicon
Fabrication of a single mode laser by UV-writing in neodymium doped silica-on-silicon
We describe the fabrication of a waveguide laser by UV-writing in neodymium doped silica-on-silicon. The substrate is fabricated by Flame Hydrolysis Deposition and solution doping techniques. Lasing at 1048-1056nm was observed with a slope efficiency of 33% and threshold of 4mW for the transition. Lasing was also observed at 1356nm.
Guilhot, D.A.
01970faf-cb6a-48ed-bb39-4f94fb7dcecc
Emmerson, G.D.
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Gawith, C.B.E.
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Shepherd, D.P.
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Smith, P.G.R.
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Guilhot, D.A.
01970faf-cb6a-48ed-bb39-4f94fb7dcecc
Emmerson, G.D.
89517051-daed-4f8e-aca6-f686d8c54e7c
Gawith, C.B.E.
926665c0-84c7-4a1d-ae19-ee6d7d14c43e
Shepherd, D.P.
9fdd51c4-39d6-41b3-9021-4c033c2f4ead
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
Guilhot, D.A., Emmerson, G.D., Gawith, C.B.E., Shepherd, D.P. and Smith, P.G.R.
(2004)
Fabrication of a single mode laser by UV-writing in neodymium doped silica-on-silicon.
EPS-QEOD Europhoton Conference, Lausanne, Switzerland.
29 Aug - 03 Sep 2004.
1 pp
.
Record type:
Conference or Workshop Item
(Paper)
Abstract
We describe the fabrication of a waveguide laser by UV-writing in neodymium doped silica-on-silicon. The substrate is fabricated by Flame Hydrolysis Deposition and solution doping techniques. Lasing at 1048-1056nm was observed with a slope efficiency of 33% and threshold of 4mW for the transition. Lasing was also observed at 1356nm.
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e-pub ahead of print date: 2004
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ThD5
Venue - Dates:
EPS-QEOD Europhoton Conference, Lausanne, Switzerland, 2004-08-29 - 2004-09-03
Identifiers
Local EPrints ID: 41696
URI: http://eprints.soton.ac.uk/id/eprint/41696
PURE UUID: af9102c8-98b6-4159-ba7f-ae854c657b22
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Date deposited: 13 Oct 2006
Last modified: 16 Mar 2024 03:12
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Contributors
Author:
D.A. Guilhot
Author:
G.D. Emmerson
Author:
D.P. Shepherd
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