Electrical phase change of Ga:La:S:Cu films

Simpson, R.E., Mairaj, A., Curry, R.J., Huang, C.C., Knight, K., Sessions, N.P., Hassan, M. and Hewak, D.W. (2007) Electrical phase change of Ga:La:S:Cu films. Electronics Letters, 43, (15), 830-831. (doi:10.1049/el:20071290).


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Ga:La:S:Cu films have been prepared by sputter deposition. Amorphous thin films were fabricated with Cu concentrations as high as 66 at.%. The electrical phase change properties of these films have been investigated. The electrical resistivity of these materials is 200 ?m in the amorphous state and 40 ?m in the crystalline state. The crystallisation time was measured using an optical pump probe method and confirmed to be 150 ns. The high resistivity of these films in both their crystalline and amorphous states allows low current, Joule, heating and therefore shows potential for the utilisation as the active layer in electrical phase change memory devices.

Item Type: Article
Digital Object Identifier (DOI): doi:10.1049/el:20071290
ISSNs: 0013-5194 (print)
Related URLs:
Keywords: Ga-La-S-Cu, amorphous state, amorphous thin films, crystallisation, electrical phase change, electrical resistivity, memory devices, optical pump probe method, sputter deposition
Subjects: Q Science > QC Physics
T Technology > TK Electrical engineering. Electronics Nuclear engineering
Divisions : University Structure - Pre August 2011 > Optoelectronics Research Centre
ePrint ID: 54044
Accepted Date and Publication Date:
19 July 2007Published
Date Deposited: 04 Aug 2008
Last Modified: 31 Mar 2016 12:33
URI: http://eprints.soton.ac.uk/id/eprint/54044

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