Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material
Cavalli, G., Banu, S., Ranasinghe, R.T., Broder, G.R., Martins, H.F.P., Neylon, C., Morgan, H., Bradley, M. and Roach, P.L. (2007) Multistep synthesis on SU-8: Combining microfabrication and solid-phase chemistry on a single material. Journal of Combinatorial Chemistry, 9, (3), 462-472. (doi:10.1021/cc060079p).
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SU-8 is an epoxy-novolac resin and a well-established negative photoresist for microfabrication and microengineering. The photopolymerized resist is an extremely highly crosslinked polymer showing outstanding chemical and physical robustness with residual surface epoxy groups amenable for chemical functionalization. In this paper we describe, for the first time, the preparation and surface modification of SU-8 particles shaped as microbars, the attachment of appropriate linkers, and the successful application of these particles to multistep solid-phase synthesis leading to oligonucleotides and peptides attached in an unambiguous manner to the support surface.
|Digital Object Identifier (DOI):||doi:10.1021/cc060079p|
|Keywords:||photoresist, oligonucleotides, immobilization, capillary-electrophoresis,high-aspect-ratio, archip epoxy, , , mass-spectrometry, peptide-synthesis, protease inhibitors, mems|
Q Science > QD Chemistry
|Divisions:||University Structure - Pre August 2011 > School of Chemistry
|Date Deposited:||31 Jul 2008|
|Last Modified:||31 Mar 2016 12:33|
Basic Technology: 4 Billion Bases a Day - Practical Individual Genome Sequencing
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