Novel fabrication methods for submicrometer Josephson junction qubits


Potts, A., Routley, P.R., Parker, G.J., Baumberg, J.J. and de Groot, P.A.J. (2001) Novel fabrication methods for submicrometer Josephson junction qubits. Journal of Materials Science: Materials in Electronics, 12, (4-6), 289-293. (doi:10.1023/A:1011279908265).

Download

Full text not available from this repository.

Original Publication URL: http://dx.doi.org/10.1023/A:1011279908265

Description/Abstract

Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al2O3/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks.

Item Type: Article
ISSNs: 0957-4522 (print)
Related URLs:
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Q Science > QC Physics
Divisions: University Structure - Pre August 2011 > School of Electronics and Computer Science
University Structure - Pre August 2011 > School of Physics and Astronomy
ePrint ID: 57550
Date Deposited: 14 Aug 2008
Last Modified: 27 Mar 2014 18:40
Contact Email Address: ap@ecs.soton.ac.uk
URI: http://eprints.soton.ac.uk/id/eprint/57550

Actions (login required)

View Item View Item