Novel fabrication methods for submicrometer Josephson junction qubits
Potts, A., Routley, P.R., Parker, G.J., Baumberg, J.J. and de Groot, P.A.J. (2001) Novel fabrication methods for submicrometer Josephson junction qubits. Journal of Materials Science: Materials in Electronics, 12, (4-6), 289-293. (doi:10.1023/A:1011279908265).
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Novel processes for the fabrication of mesoscopic Josephson junction qubits have been developed, based on superconducting Al/Al2O3/Al tunnel junctions. These are fabricated by electron beam lithography using single-layer and multi-layer resists, and standard processes that are compatible with conventional CMOS processing. The new single-layer resist process is found to have significant advantages over conventional fabrication methods using suspended tri-layer shadow masks.
|Digital Object Identifier (DOI):||doi:10.1023/A:1011279908265|
|Subjects:||T Technology > TA Engineering (General). Civil engineering (General)
Q Science > QC Physics
|Divisions:||University Structure - Pre August 2011 > School of Electronics and Computer Science
University Structure - Pre August 2011 > School of Physics and Astronomy
|Date Deposited:||14 Aug 2008|
|Last Modified:||06 Aug 2015 02:47|
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
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