Structure and mechanical properties of reactive sputtering CrSiN films


Zhang, Guangan, Wang, Liping, Wang, S.C., Yan, Pengxun and Xue, Qunji (2009) Structure and mechanical properties of reactive sputtering CrSiN films. Applied Surface Science, 255, (8), 4425-4429. (doi:10.1016/j.apsusc.2008.11.036).

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Description/Abstract

CrSiN films with various Si contents were deposited by reactive magnetron sputtering using the codeposition of Cr and Si targets in the presence of the reactive gas mixture. Comparative studies on microstructure and mechanical properties between CrN and CrSiN films with various Si contents were carried out. The structure of the CrSiN films was found to change from crystalline to amorphous structure as the Si contents increase. Amorphous phase of Si3N4 compound was suggested to exist in the CrSiN film. The growth of films has been observed from continuous columnar structure, granular structure to glassy-like appearance morphology with the increase of silicon content. The film fracture changed from continuous columnar structure, granular structure to glassy-like appearance morphology with the
increase of silicon content. Two hardness peaks of the films as function of Si contents have been discussed.

Item Type: Article
ISSNs: 0169-4332 (print)
Related URLs:
Keywords: CrSiN films, magnetron sputtering, microstructure, mechanical properties
Subjects: T Technology > TP Chemical technology
Q Science > QD Chemistry
T Technology > TA Engineering (General). Civil engineering (General)
Divisions: University Structure - Pre August 2011 > School of Engineering Sciences > Engineering Materials & Surface Engineering
ePrint ID: 64847
Date Deposited: 25 Jun 2009
Last Modified: 27 Mar 2014 18:46
URI: http://eprints.soton.ac.uk/id/eprint/64847

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