Ablated gratings on borosilicate glass by 193nm excimer laser radiation
Ablated gratings on borosilicate glass by 193nm excimer laser radiation
The application of 193nm ArF excimer laser radiation to the fabrication of high-quality sub-micron relief gratings in Er/Yb-doped borosilicate glass using an interferometric system is presented. High quality relief gratings imprinted in silicate telecom glasses may find significant application in optical telecommunications or photonic band-gap fields in the near future. In particular, relief gratings applied to fibre or waveguide devices may provide high diffraction efficiencies over reduced dimensions compared with photorefractive gratings. Their straightforward application to a wide range of materials and the single step imprinting process are additional advantages. The ablation of BK-7 borosilicate glass using 193nm excimer laser radiation produces high quality surface etching when compared to 248nm radiation, prompting the use of this shorter wavelength for the fabrication of high-quality sub-micron structures.
Pissadakis, S.
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Reekie, L.
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Hempstead, M.
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Zervas, M.N.
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Wilkinson, J.S.
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Pissadakis, S.
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Reekie, L.
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Hempstead, M.
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Zervas, M.N.
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Wilkinson, J.S.
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Pissadakis, S., Reekie, L., Hempstead, M., Zervas, M.N. and Wilkinson, J.S.
(1999)
Ablated gratings on borosilicate glass by 193nm excimer laser radiation.
5th International Conference on Laser Ablation (COLA 99), Goettingen, Germany.
19 - 23 Jul 1999.
Record type:
Conference or Workshop Item
(Paper)
Abstract
The application of 193nm ArF excimer laser radiation to the fabrication of high-quality sub-micron relief gratings in Er/Yb-doped borosilicate glass using an interferometric system is presented. High quality relief gratings imprinted in silicate telecom glasses may find significant application in optical telecommunications or photonic band-gap fields in the near future. In particular, relief gratings applied to fibre or waveguide devices may provide high diffraction efficiencies over reduced dimensions compared with photorefractive gratings. Their straightforward application to a wide range of materials and the single step imprinting process are additional advantages. The ablation of BK-7 borosilicate glass using 193nm excimer laser radiation produces high quality surface etching when compared to 248nm radiation, prompting the use of this shorter wavelength for the fabrication of high-quality sub-micron structures.
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- Author's Original
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e-pub ahead of print date: 1999
Venue - Dates:
5th International Conference on Laser Ablation (COLA 99), Goettingen, Germany, 1999-07-19 - 1999-07-23
Organisations:
Optoelectronics Research Centre
Identifiers
Local EPrints ID: 76543
URI: http://eprints.soton.ac.uk/id/eprint/76543
PURE UUID: 5c605d9c-8846-4028-b771-06d4d0e7d361
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Date deposited: 11 Mar 2010
Last modified: 14 Mar 2024 02:35
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Contributors
Author:
S. Pissadakis
Author:
L. Reekie
Author:
M. Hempstead
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