Light induced frustration of etching in Fe doped LiNbO3

Barry, I.E., Eason, R.W. and Cook, G. (1999) Light induced frustration of etching in Fe doped LiNbO3. In, Lasers and Electro-Optics 1999. Conference on Lasers and Electro-Optics (CLEO '99) Piscataway, United States, Institute of Electrical and Electronics Engineers, 384-385. (doi:10.1109/CLEO.1999.834342).


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We report frustration of normal etching in iron doped lithium niobate by incident 488nm light. At intensities > 1 Wcm etching is fully suppressed. We report the techniques' resolution and the effect of applied electric fields

Item Type: Book Section
Digital Object Identifier (DOI): doi:10.1109/CLEO.1999.834342
Additional Information: ,
ISBNs: 1557525951
Related URLs:
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
Q Science > QC Physics
Divisions : University Structure - Pre August 2011 > Optoelectronics Research Centre
University Structure - Pre August 2011 > School of Physics and Astronomy
ePrint ID: 76570
Accepted Date and Publication Date:
Date Deposited: 11 Mar 2010
Last Modified: 31 Mar 2016 13:10

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