Light induced frustration of etching in Fe doped LiNbO3
Barry, I.E., Eason, R.W. and Cook, G. (1999) Light induced frustration of etching in Fe doped LiNbO3. In, Lasers and Electro-Optics 1999. Conference on Lasers and Electro-Optics (CLEO '99) Piscataway, United States, Institute of Electrical and Electronics Engineers, 384-385. (doi:10.1109/CLEO.1999.834342).
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We report frustration of normal etching in iron doped lithium niobate by incident 488nm light. At intensities > 1 Wcm etching is fully suppressed. We report the techniques' resolution and the effect of applied electric fields
|Item Type:||Book Section|
|Subjects:||T Technology > TK Electrical engineering. Electronics Nuclear engineering
Q Science > QC Physics
|Divisions:||University Structure - Pre August 2011 > Optoelectronics Research Centre
University Structure - Pre August 2011 > School of Physics and Astronomy
|Date Deposited:||11 Mar 2010|
|Last Modified:||06 Aug 2015 02:58|
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
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