Light induced frustration of etching in Fe doped LiNbO3
Barry, I.E., Eason, R.W. and Cook, G. (1999) Light induced frustration of etching in Fe doped LiNbO3. In, Lasers and Electro-Optics 1999. Conference on Lasers and Electro-Optics (CLEO '99) Piscataway, United States, Institute of Electrical and Electronics Engineers, 384-385. (doi:10.1109/CLEO.1999.834342 ).
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Description/Abstract
We report frustration of normal etching in iron doped lithium niobate by incident 488nm light. At intensities > 1 Wcm etching is fully suppressed. We report the techniques' resolution and the effect of applied electric fields
| Item Type: | Book Section |
|---|---|
| Additional Information: | , |
| ISBNs: | 1557525951 |
| Related URLs: | |
| Subjects: | T Technology > TK Electrical engineering. Electronics Nuclear engineering Q Science > QC Physics |
| Divisions: | University Structure - Pre August 2011 > Optoelectronics Research Centre University Structure - Pre August 2011 > School of Physics and Astronomy |
| Item ID: | 76570 |
| Date Deposited: | 11 Mar 2010 |
| Last Modified: | 02 Mar 2012 12:23 |
| Contributors: | Barry, I.E. (Author) Eason, R.W. (Author) Cook, G. (Author) |
| Date: | 1999 |
| Additional Information: | , |
| Status: | Published |
| Publisher: | Institute of Electrical and Electronics Engineers |
| URI: | http://eprints.soton.ac.uk/id/eprint/76570 |
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