Light induced frustration of etching in Fe doped LiNbO3


Barry, I.E., Eason, R.W. and Cook, G. (1999) Light induced frustration of etching in Fe doped LiNbO3. In, Lasers and Electro-Optics 1999. Conference on Lasers and Electro-Optics (CLEO '99) Piscataway, United States, Institute of Electrical and Electronics Engineers, 384-385. (doi:10.1109/CLEO.1999.834342 ).

Download

Full text not available from this repository.

Description/Abstract

We report frustration of normal etching in iron doped lithium niobate by incident 488nm light. At intensities > 1 Wcm etching is fully suppressed. We report the techniques' resolution and the effect of applied electric fields

Item Type: Book Section
Additional Information: ,
ISBNs: 1557525951
Related URLs:
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
Q Science > QC Physics
Divisions: University Structure - Pre August 2011 > Optoelectronics Research Centre
University Structure - Pre August 2011 > School of Physics and Astronomy
ePrint ID: 76570
Date Deposited: 11 Mar 2010
Last Modified: 27 Mar 2014 18:55
Publisher: Institute of Electrical and Electronics Engineers
URI: http://eprints.soton.ac.uk/id/eprint/76570

Actions (login required)

View Item View Item