Epitaxial thin film and ion-implanted waveguide lasers
Shepherd, D.P., Hanna, D.C., Jones, J.K., Large, A.C., Tropper, A.C., Chandler, P.J., Kakarantzas, G., Townsend, P.D., Zhang, L., Chartier, I., Ferrand, B. and Pelenc, D. (1993) Epitaxial thin film and ion-implanted waveguide lasers. International Symposium on Optoelectronic Materials, Honolulu, US, Nov 1993.
Full text not available from this repository.
We report two methods of producing planar technology waveguides for low threshold laser operation. Ion-implantation can make waveguides in many materials with waveguide laser operation so far observed in YAG, GGG, YAP, LiNbO3, BGO and glass, doped with Nd3+, Yb3+, and Tm3+. 2D and 3D guides have been fabricated and propagation losses as low as 0.15dB/cm can be obtained. Liquid-phase epitaxial thin film growth has so far produced Nd3+ and Yb3+ doped YAG, 2D waveguide lasers. Extension to new materials and production of 3D guides is currently under consideration. These guides have losses as low as 0.05dB/cm and have potential both as low threshold longitudinally pumped lasers and high average power side pumped devices.
|Item Type:||Conference or Workshop Item (Invited Paper)|
|Subjects:||Q Science > QC Physics
T Technology > TK Electrical engineering. Electronics Nuclear engineering
|Divisions:||University Structure - Pre August 2011 > Optoelectronics Research Centre
|Date Deposited:||11 Mar 2010|
|Last Modified:||15 Aug 2015 16:53|
|RDF:||RDF+N-Triples, RDF+N3, RDF+XML, Browse.|
Actions (login required)