Photorefractive damage removal in annealed-proton-exchanged LiNbO3 channel waveguides

Robertson, Elaine E., Eason, Robert W., Yokoo, Yoshiatsu and Chandler, Peter J. (1997) Photorefractive damage removal in annealed-proton-exchanged LiNbO3 channel waveguides. Applied Physics Letters, 70, (16), 2094-2096.


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Ion beam implantation has been used as a postprocessing technique to dramatically reduce the photorefractive effect in lithium niobate channel waveguides. The waveguides were fabricated by proton exchange and then annealed 1.0 MeV H+ ions were implanted through the existing channel waveguides such that the "damaged layer" was created beneath the existing channel waveguide. The output characteristics from the waveguides were subsequently examined. Highly stable, single-mode outputs were observed with the waveguides retaining up to 95% of their original transmission. It is thought that this decrease in photorefractive susceptibility can be explained by the implant changing the defect structure and hence photovoltaic properties of the material

Item Type: Article
Additional Information:
ISSNs: 0003-6951 (print)
1520-8842 (electronic)
Related URLs:
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering
Q Science > QC Physics
Divisions : University Structure - Pre August 2011 > Optoelectronics Research Centre
ePrint ID: 78021
Accepted Date and Publication Date:
April 1997Published
Date Deposited: 11 Mar 2010
Last Modified: 31 Mar 2016 13:12

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