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In situ measurement of zinc oxide thin film thickness and optical losses

In situ measurement of zinc oxide thin film thickness and optical losses
In situ measurement of zinc oxide thin film thickness and optical losses
We report a simple and accurate interferometric method for simultaneous, in situ measurement of both the thickness and the depth resolved optical losses of thin transparent films. The experimental arrangement is simple, requiring only a laser and a detector regardless of the substrate. The originality of our method is based on the evaluation of the optical losses from the envelopes of the laser signal, while the thickness is measured conventionally by counting the number of signal periods. The technique has been tested while growing ZnO films in a planar RF magnetron sputtering system. Using the above method, the evolution of optical losses is easily observed during deposition, leading to the possibility of a real time control of the film quality. Both theoretical calculations and experimental results are presented in this letter.
0003-6951
161-163
Wacogne, B.
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Pannell, C.N.
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Roe, M.P.
c0b88f51-a78a-4415-b9fb-76fff227acdd
Pattinson, T.J.
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Wacogne, B.
0d617e12-1bf8-46ba-b8ad-d8b524805b94
Pannell, C.N.
002fadf4-f97e-4732-b171-73ed7563ee18
Roe, M.P.
c0b88f51-a78a-4415-b9fb-76fff227acdd
Pattinson, T.J.
dced7952-d609-4b31-90b8-856db311ede7

Wacogne, B., Pannell, C.N., Roe, M.P. and Pattinson, T.J. (1995) In situ measurement of zinc oxide thin film thickness and optical losses. Applied Physics Letters, 67 (2), 161-163. (doi:10.1063/1.114653).

Record type: Article

Abstract

We report a simple and accurate interferometric method for simultaneous, in situ measurement of both the thickness and the depth resolved optical losses of thin transparent films. The experimental arrangement is simple, requiring only a laser and a detector regardless of the substrate. The originality of our method is based on the evaluation of the optical losses from the envelopes of the laser signal, while the thickness is measured conventionally by counting the number of signal periods. The technique has been tested while growing ZnO films in a planar RF magnetron sputtering system. Using the above method, the evolution of optical losses is easily observed during deposition, leading to the possibility of a real time control of the film quality. Both theoretical calculations and experimental results are presented in this letter.

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Published date: July 1995

Identifiers

Local EPrints ID: 78208
URI: http://eprints.soton.ac.uk/id/eprint/78208
ISSN: 0003-6951
PURE UUID: cba39869-9175-408f-99a7-0ae1cd259177

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Date deposited: 11 Mar 2010
Last modified: 14 Mar 2024 00:08

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Contributors

Author: B. Wacogne
Author: C.N. Pannell
Author: M.P. Roe
Author: T.J. Pattinson

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