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Si/Si0.64Ge0.36/Si pMOSFETs with Enhanced Voltage Gain and Low 1/f Noise

Si/Si0.64Ge0.36/Si pMOSFETs with Enhanced Voltage Gain and Low 1/f Noise
Si/Si0.64Ge0.36/Si pMOSFETs with Enhanced Voltage Gain and Low 1/f Noise
Si/Si0.64Fe0.36/Si p MOSFETs with written gate lengths in the range 0.5mu micron to 10mu micron have been fabricated in a reduced thermal budget variant of a standard CMOS process. The devices exhibit enhanced maximum voltage-gains and reduced 1/f noise as compared to silicon controls.
Prest, M. J.
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Palmer, M. J.
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Braithwaite, G.
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Grasby, T. J.
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Phillips, P. J.
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Mironov, O. A.
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Parker, E. H. C.
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Whall, T. E.
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Waite, A. M.
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Evans, A. G. R.
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Prest, M. J.
c8a65f9f-aa7b-4e3b-b621-ecf8ff421c9b
Palmer, M. J.
de88e9dd-21ac-44d7-ace7-f88000bb3f11
Braithwaite, G.
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Grasby, T. J.
b76c376c-ada8-4c6d-a7f3-fdf6a14eb027
Phillips, P. J.
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Mironov, O. A.
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Parker, E. H. C.
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Whall, T. E.
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Waite, A. M.
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Evans, A. G. R.
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Prest, M. J., Palmer, M. J., Braithwaite, G., Grasby, T. J., Phillips, P. J., Mironov, O. A., Parker, E. H. C., Whall, T. E., Waite, A. M. and Evans, A. G. R. (2001) Si/Si0.64Ge0.36/Si pMOSFETs with Enhanced Voltage Gain and Low 1/f Noise.

Record type: Other

Abstract

Si/Si0.64Fe0.36/Si p MOSFETs with written gate lengths in the range 0.5mu micron to 10mu micron have been fabricated in a reduced thermal budget variant of a standard CMOS process. The devices exhibit enhanced maximum voltage-gains and reduced 1/f noise as compared to silicon controls.

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More information

Published date: 2001
Additional Information: Organisation: ESSDERC 2001
Organisations: Nanoelectronics and Nanotechnology

Identifiers

Local EPrints ID: 256168
URI: http://eprints.soton.ac.uk/id/eprint/256168
PURE UUID: 9bbed223-aed1-4489-9ed6-d70a74a2eb62

Catalogue record

Date deposited: 10 Dec 2001
Last modified: 08 Jan 2022 17:39

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Contributors

Author: M. J. Prest
Author: M. J. Palmer
Author: G. Braithwaite
Author: T. J. Grasby
Author: P. J. Phillips
Author: O. A. Mironov
Author: E. H. C. Parker
Author: T. E. Whall
Author: A. M. Waite
Author: A. G. R. Evans

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