LiNbO3 optical waveguides deposited on sapphire by electric-field-assisted pulsed laser deposition
LiNbO3 optical waveguides deposited on sapphire by electric-field-assisted pulsed laser deposition
Oriented LiNbO3 films have been grown on sapphire (1 1 0 2) substrates by low electric-field-assisted pulsed laser deposition. KrF excimer laser (248 nm) has been utilized for the ablation of monocrystalline stoichiometric target. The deposition was performed at all substrate temperatures in the range of 550–800°C in an oxygen atmosphere. The ablation threshold of 2.5 J/cm2 for the monocrystalline target was determined from the experimental results presenting ablation rate vs. laser fluence dependence. Electro-optical properties of these films appeared to be strongly dependent on the process parameters (substrate temperature, oxygen partial pressure, electric field), demonstrating the importance of the epitaxial growth control during the deposition. The films structure and morphology were characterized by XRD and AFM, respectively. The waveguide properties of the films were studied experimentally.
Laser ablation, Thin films, Lithium niobate
396-403
Tomov, R.I.
30bb8922-7879-45e4-8be9-f17d59a30509
Kabadjova, T.K.
ffd45946-18c5-4539-bdad-de2b805b976e
Atanasov, P.A.
3abb0017-61cd-4929-8f76-7d1f97c6182c
Tonchev, S.
66941638-e7d2-4cf3-adb6-88f6eec921d3
Kaneva, M.
e29e2033-4fd3-4711-b0bd-3b5f9c9f601a
Zherikhin, A.
511d0b4d-6d01-41f1-9be7-5f4b30850215
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
2000
Tomov, R.I.
30bb8922-7879-45e4-8be9-f17d59a30509
Kabadjova, T.K.
ffd45946-18c5-4539-bdad-de2b805b976e
Atanasov, P.A.
3abb0017-61cd-4929-8f76-7d1f97c6182c
Tonchev, S.
66941638-e7d2-4cf3-adb6-88f6eec921d3
Kaneva, M.
e29e2033-4fd3-4711-b0bd-3b5f9c9f601a
Zherikhin, A.
511d0b4d-6d01-41f1-9be7-5f4b30850215
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Tomov, R.I., Kabadjova, T.K., Atanasov, P.A., Tonchev, S., Kaneva, M., Zherikhin, A. and Eason, R.W.
(2000)
LiNbO3 optical waveguides deposited on sapphire by electric-field-assisted pulsed laser deposition.
Vacuum, 58 (2-3), .
(doi:10.1016/S0042-207X(00)00196-2).
Abstract
Oriented LiNbO3 films have been grown on sapphire (1 1 0 2) substrates by low electric-field-assisted pulsed laser deposition. KrF excimer laser (248 nm) has been utilized for the ablation of monocrystalline stoichiometric target. The deposition was performed at all substrate temperatures in the range of 550–800°C in an oxygen atmosphere. The ablation threshold of 2.5 J/cm2 for the monocrystalline target was determined from the experimental results presenting ablation rate vs. laser fluence dependence. Electro-optical properties of these films appeared to be strongly dependent on the process parameters (substrate temperature, oxygen partial pressure, electric field), demonstrating the importance of the epitaxial growth control during the deposition. The films structure and morphology were characterized by XRD and AFM, respectively. The waveguide properties of the films were studied experimentally.
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Published date: 2000
Keywords:
Laser ablation, Thin films, Lithium niobate
Identifiers
Local EPrints ID: 13617
URI: http://eprints.soton.ac.uk/id/eprint/13617
ISSN: 0042-207X
PURE UUID: 452a8a39-800e-4079-918a-2bfa7ad6155d
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Date deposited: 06 Jan 2005
Last modified: 16 Mar 2024 02:37
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Contributors
Author:
R.I. Tomov
Author:
T.K. Kabadjova
Author:
P.A. Atanasov
Author:
S. Tonchev
Author:
M. Kaneva
Author:
A. Zherikhin
Author:
R.W. Eason
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