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Holographic recording mechanisms of gratings in indium oxide films using 325nm Helium-Cadmium laser irradiation

Holographic recording mechanisms of gratings in indium oxide films using 325nm Helium-Cadmium laser irradiation
Holographic recording mechanisms of gratings in indium oxide films using 325nm Helium-Cadmium laser irradiation
UV (325 nm) holographic recording of gratings in indium oxide films fabricated by reactive pulsed laser deposition has been investigated as a function of growth temperature, oxygen pressure and angle of incidence of the plasma plume on the substrate. The influence of the ambient environment (air or vacuum) and the film temperature during recording has also been studied. Large steady state refractive index changes up to 6×10-3 were observed in layers grown at an oblique angle of 75°. About 77% of the magnitude of these changes residues after thermal annealing and is attributed to UV-induced permanent structural rearrangements. In contrast, refractive index changes in films grown at normal incidence were smaller in magnitude and completely reversible.
0947-8396
457-465
Grivas, C.
085534a3-9e02-4992-8882-46a95c1e5824
Mailis, S.
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Tzamali, E.
ad8ba683-f42e-4970-b021-15f90af5055f
Vainos, N.A.
e4f22637-2f1c-4dec-af67-d059261dd5b2
Grivas, C.
085534a3-9e02-4992-8882-46a95c1e5824
Mailis, S.
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Tzamali, E.
ad8ba683-f42e-4970-b021-15f90af5055f
Vainos, N.A.
e4f22637-2f1c-4dec-af67-d059261dd5b2

Grivas, C., Mailis, S., Eason, R.W., Tzamali, E. and Vainos, N.A. (2002) Holographic recording mechanisms of gratings in indium oxide films using 325nm Helium-Cadmium laser irradiation. Applied Physics A: Materials Science & Processing, 74 (4), 457-465. (doi:10.1007/s003390101134).

Record type: Article

Abstract

UV (325 nm) holographic recording of gratings in indium oxide films fabricated by reactive pulsed laser deposition has been investigated as a function of growth temperature, oxygen pressure and angle of incidence of the plasma plume on the substrate. The influence of the ambient environment (air or vacuum) and the film temperature during recording has also been studied. Large steady state refractive index changes up to 6×10-3 were observed in layers grown at an oblique angle of 75°. About 77% of the magnitude of these changes residues after thermal annealing and is attributed to UV-induced permanent structural rearrangements. In contrast, refractive index changes in films grown at normal incidence were smaller in magnitude and completely reversible.

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Published date: 2002

Identifiers

Local EPrints ID: 13801
URI: https://eprints.soton.ac.uk/id/eprint/13801
ISSN: 0947-8396
PURE UUID: d5400806-964a-49f9-9d86-7deb5d7b7bab
ORCID for S. Mailis: ORCID iD orcid.org/0000-0001-8100-2670
ORCID for R.W. Eason: ORCID iD orcid.org/0000-0001-9704-2204

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Date deposited: 12 Jan 2005
Last modified: 20 Jul 2019 01:25

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