Microstructuring of lithium niobate single crystals using pulsed UV laser modification of etching characteristics
Microstructuring of lithium niobate single crystals using pulsed UV laser modification of etching characteristics
We report a modification in the etching characteristics of lithium niobate (LiNbO3) single crystals induced by irradiating the crystal surface with pulsed UV laser light at fluences just below the ablation threshold. Modified etching behaviour has been observed using 248, 308 and 355 nm light from excimers and frequency tripled YAG lasers, for x-cut and z-cut surfaces. Both etch enhancement and etch frustration has been observed, depending on the choice of irradiation conditions. The maximum depth of surface relief structures achieved so far is >2 µm for the -z face, using etching frustration. The potential applications for microstructuring LiNbO3 using these modified etching techniques are also discussed.
Lithium niobate, Etching frustration, Laser ablation, Microstructuring, UV irradiation
125-134
Brown, P.T.
c0ceea70-af5f-4b50-9c67-93e32a198336
Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Zergioti, I.
97fd5ac7-1c63-4bc3-a2b6-3ecea9dd86f1
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
2002
Brown, P.T.
c0ceea70-af5f-4b50-9c67-93e32a198336
Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Zergioti, I.
97fd5ac7-1c63-4bc3-a2b6-3ecea9dd86f1
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Brown, P.T., Mailis, Sakellaris, Zergioti, I. and Eason, R.W.
(2002)
Microstructuring of lithium niobate single crystals using pulsed UV laser modification of etching characteristics.
Optical Materials, 20 (2), .
(doi:10.1016/S0925-3467(02)00058-7).
Abstract
We report a modification in the etching characteristics of lithium niobate (LiNbO3) single crystals induced by irradiating the crystal surface with pulsed UV laser light at fluences just below the ablation threshold. Modified etching behaviour has been observed using 248, 308 and 355 nm light from excimers and frequency tripled YAG lasers, for x-cut and z-cut surfaces. Both etch enhancement and etch frustration has been observed, depending on the choice of irradiation conditions. The maximum depth of surface relief structures achieved so far is >2 µm for the -z face, using etching frustration. The potential applications for microstructuring LiNbO3 using these modified etching techniques are also discussed.
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Published date: 2002
Keywords:
Lithium niobate, Etching frustration, Laser ablation, Microstructuring, UV irradiation
Identifiers
Local EPrints ID: 13808
URI: http://eprints.soton.ac.uk/id/eprint/13808
PURE UUID: 6822fa3d-5b18-417c-959a-a33824ea9f15
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Date deposited: 05 Jan 2005
Last modified: 16 Mar 2024 02:37
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Contributors
Author:
P.T. Brown
Author:
Sakellaris Mailis
Author:
I. Zergioti
Author:
R.W. Eason
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