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Continuous wave ultra violet radiation induced frustration of etching in lithium niobate single crystals

Continuous wave ultra violet radiation induced frustration of etching in lithium niobate single crystals
Continuous wave ultra violet radiation induced frustration of etching in lithium niobate single crystals
Illumination of the -z face of congruent lithium niobate single crystals with continuous wave (c.w.) ultraviolet (UV) laser radiation modifies the response of the surface to subsequent acid etching. A frequency doubled Ar+ laser (lambda=244 nm) was used to illuminate the -z crystal face making it resistive to HF etching and thus transforming the illuminated tracks into ridge structures. This process enables the fabrication of relief patterns in a photolithographic manner. Spatially resolved Raman spectroscopy indicates preservation of the good crystal quality after irradiation.
0169-4332
46-52
Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Riziotis, C.
a2037f27-c711-46c3-bec4-2293fca6f0e0
Smith, Peter G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
Scott, J.G.
a5e576f1-39c6-4c3b-a0e2-42e388e9b583
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020
Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Riziotis, C.
a2037f27-c711-46c3-bec4-2293fca6f0e0
Smith, Peter G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
Scott, J.G.
a5e576f1-39c6-4c3b-a0e2-42e388e9b583
Eason, R.W.
e38684c3-d18c-41b9-a4aa-def67283b020

Mailis, Sakellaris, Riziotis, C., Smith, Peter G.R., Scott, J.G. and Eason, R.W. (2003) Continuous wave ultra violet radiation induced frustration of etching in lithium niobate single crystals. Applied Surface Science, 206 (1-4), 46-52. (doi:10.1016/S0169-4332(02)01117-0).

Record type: Article

Abstract

Illumination of the -z face of congruent lithium niobate single crystals with continuous wave (c.w.) ultraviolet (UV) laser radiation modifies the response of the surface to subsequent acid etching. A frequency doubled Ar+ laser (lambda=244 nm) was used to illuminate the -z crystal face making it resistive to HF etching and thus transforming the illuminated tracks into ridge structures. This process enables the fabrication of relief patterns in a photolithographic manner. Spatially resolved Raman spectroscopy indicates preservation of the good crystal quality after irradiation.

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Published date: 2003
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Identifiers

Local EPrints ID: 13892
URI: http://eprints.soton.ac.uk/id/eprint/13892
DOI: doi:10.1016/S0169-4332(02)01117-0
ISSN: 0169-4332
PURE UUID: 90658152-881e-4822-8f5d-4f2e3f65e253
ORCID for Sakellaris Mailis: ORCID iD orcid.org/0000-0001-8100-2670
ORCID for Peter G.R. Smith: ORCID iD orcid.org/0000-0003-0319-718X
ORCID for R.W. Eason: ORCID iD orcid.org/0000-0001-9704-2204

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Date deposited: 11 Jan 2005
Last modified: 16 Mar 2024 02:49

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Contributors

Author: Sakellaris Mailis ORCID iD
Author: C. Riziotis
Author: Peter G.R. Smith ORCID iD
Author: J.G. Scott
Author: R.W. Eason ORCID iD

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