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Deposition and characterization of germanium sulphide glass planar waveguides

Deposition and characterization of germanium sulphide glass planar waveguides
Deposition and characterization of germanium sulphide glass planar waveguides
Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12µm/hr at 500°C. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5µm to 7µm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093±0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1±0.3 dB/cm.
1094-4087
2501-2505
Huang, Chung-Che
825f7447-6d02-48f6-b95a-fa33da71f106
Hewak, Daniel
87c80070-c101-4f7a-914f-4cc3131e3db0
Badding, J.V.
940f7adb-73df-4f8a-9c46-e47f5425fef0
Huang, Chung-Che
825f7447-6d02-48f6-b95a-fa33da71f106
Hewak, Daniel
87c80070-c101-4f7a-914f-4cc3131e3db0
Badding, J.V.
940f7adb-73df-4f8a-9c46-e47f5425fef0

Huang, Chung-Che, Hewak, Daniel and Badding, J.V. (2004) Deposition and characterization of germanium sulphide glass planar waveguides. Optics Express, 12 (11), 2501-2505. (doi:10.1364/OPEX.12.002501).

Record type: Article

Abstract

Germanium sulphide glass thin films have been deposited on CaF2 and Schott N-PSK58 glass substrates directly by means of chemical vapor deposition (CVD). The deposition rate of germanium sulphide glass film by this CVD process is estimated about 12µm/hr at 500°C. These films have been characterized by micro-Raman spectroscopy, X-ray diffraction (XRD), and scanning electron microscopy (SEM). Their transmission range extends from 0.5µm to 7µm measured by UV-VIS-NIR and FT-IR spectroscopy. The refractive index of germanium sulphide glass film measured by prism coupling technique was 2.093±0.008 and the waveguide loss measured at 632.8nm by He-Ne laser was 2.1±0.3 dB/cm.

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More information

Published date: 2004
Organisations: Optoelectronics Research Centre

Identifiers

Local EPrints ID: 13905
URI: http://eprints.soton.ac.uk/id/eprint/13905
ISSN: 1094-4087
PURE UUID: 0c339d17-89a3-47fb-8d18-c47cac6e2ffd
ORCID for Chung-Che Huang: ORCID iD orcid.org/0000-0003-3471-2463
ORCID for Daniel Hewak: ORCID iD orcid.org/0000-0002-2093-5773

Catalogue record

Date deposited: 31 Dec 2004
Last modified: 18 Feb 2021 17:05

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