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Sub-micron period grating structures in Ta2O5 thin oxide films patterned using UV laser post-exposure chemically assisted selective etching

Sub-micron period grating structures in Ta2O5 thin oxide films patterned using UV laser post-exposure chemically assisted selective etching
Sub-micron period grating structures in Ta2O5 thin oxide films patterned using UV laser post-exposure chemically assisted selective etching
A high-resolution and low-damage method for patterning relief structures in thin Ta2O5 films by chemically assisted UV laser selective etching is presented. The method is based on the initial exposure of the Ta2O5 films to pulsed UV radiation (quadrupled Nd:YAG laser at 266 nm) at fluences below the ablation threshold, for the creation of volume damage in the exposed areas. Subsequent immersion of the exposed sample in a KOH solution results in selective etching of the UV-exposed areas, developing relief structures of high quality. Interferometric exposure was used for the patterning of such gratings with periods of the order of 500 nm in films with a thickness of 100 and 500 nm. The behaviour of the patterning process is studied using diffraction efficiency measurements and AFM scans. Diffraction efficiency increases by a factor of ~63, compared to the undeveloped structure, were obtained for gratings exposed with 1000 pulses of 30 mJ/cm2 energy density, which were developed in a KOH solution. The etching method presented is being applied to the fabrication of gratings in optical waveguides.
Tantalum pentoxide, Gratings, Etching, Laser ablation, Waveguides
0040-6090
458-461
Pissadakis, S.
a91c54e0-3b8d-479f-b44e-e678bc34a277
Ikiades, A.
6b4f12e0-7ded-43fb-8a61-e2b725f65cb3
Tai, C.Y.
5ce36f32-5d16-4c47-971f-ce5b86092061
Sessions, Neil
ee737092-56b4-403e-a2f9-764e07e42625
Wilkinson, J.S.
73483cf3-d9f2-4688-9b09-1c84257884ca
Pissadakis, S.
a91c54e0-3b8d-479f-b44e-e678bc34a277
Ikiades, A.
6b4f12e0-7ded-43fb-8a61-e2b725f65cb3
Tai, C.Y.
5ce36f32-5d16-4c47-971f-ce5b86092061
Sessions, Neil
ee737092-56b4-403e-a2f9-764e07e42625
Wilkinson, J.S.
73483cf3-d9f2-4688-9b09-1c84257884ca

Pissadakis, S., Ikiades, A., Tai, C.Y., Sessions, Neil and Wilkinson, J.S. (2004) Sub-micron period grating structures in Ta2O5 thin oxide films patterned using UV laser post-exposure chemically assisted selective etching Thin Solid Films, 453-454, pp. 458-461.

Record type: Article

Abstract

A high-resolution and low-damage method for patterning relief structures in thin Ta2O5 films by chemically assisted UV laser selective etching is presented. The method is based on the initial exposure of the Ta2O5 films to pulsed UV radiation (quadrupled Nd:YAG laser at 266 nm) at fluences below the ablation threshold, for the creation of volume damage in the exposed areas. Subsequent immersion of the exposed sample in a KOH solution results in selective etching of the UV-exposed areas, developing relief structures of high quality. Interferometric exposure was used for the patterning of such gratings with periods of the order of 500 nm in films with a thickness of 100 and 500 nm. The behaviour of the patterning process is studied using diffraction efficiency measurements and AFM scans. Diffraction efficiency increases by a factor of ~63, compared to the undeveloped structure, were obtained for gratings exposed with 1000 pulses of 30 mJ/cm2 energy density, which were developed in a KOH solution. The etching method presented is being applied to the fabrication of gratings in optical waveguides.

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More information

Published date: 2004
Keywords: Tantalum pentoxide, Gratings, Etching, Laser ablation, Waveguides

Identifiers

Local EPrints ID: 13925
URI: http://eprints.soton.ac.uk/id/eprint/13925
ISSN: 0040-6090
PURE UUID: d05727b0-3f0c-486e-965d-530d01b947a8
ORCID for J.S. Wilkinson: ORCID iD orcid.org/0000-0003-4712-1697

Catalogue record

Date deposited: 08 Feb 2005
Last modified: 11 Aug 2017 14:12

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Contributors

Author: S. Pissadakis
Author: A. Ikiades
Author: C.Y. Tai
Author: Neil Sessions
Author: J.S. Wilkinson ORCID iD

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