Excitation energy transfer rate from langmuir blodgett (LB) dye monolayers to silicon: effect of aggregate formation
Excitation energy transfer rate from langmuir blodgett (LB) dye monolayers to silicon: effect of aggregate formation
Time-resolved emission spectra (TRES) and decay curves have been recorded from mixed LB oxacarbocyanine
dye monolayers and stearic acid at different distances to the silicon surface. We observe interlayer
energy transfer between monomers and dimers present in the monolayer competing directly with energy
transfer to silicon at close distances. We resolve these competing processes by studying the TRES spectra
and decompose them into their emission components. We found the energy transfer rate for the monomer
to silicon to be double than that of the dimer at a distance of d ~ 5 nm to the silicon surface. The
Förster radius for the energy transfer to silicon was estimated at 5.5 ± 0.5 nm.
194-199
Danos, Lefteris
c831e137-37b9-42cc-ab8c-49de31038922
Markvart, Tomas
f21e82ec-4e3b-4485-9f27-ffc0102fdf1c
26 April 2010
Danos, Lefteris
c831e137-37b9-42cc-ab8c-49de31038922
Markvart, Tomas
f21e82ec-4e3b-4485-9f27-ffc0102fdf1c
Danos, Lefteris and Markvart, Tomas
(2010)
Excitation energy transfer rate from langmuir blodgett (LB) dye monolayers to silicon: effect of aggregate formation.
Chemical Physics Letters, 490 (4-6), .
(doi:10.1016/j.cplett.2010.03.045).
Abstract
Time-resolved emission spectra (TRES) and decay curves have been recorded from mixed LB oxacarbocyanine
dye monolayers and stearic acid at different distances to the silicon surface. We observe interlayer
energy transfer between monomers and dimers present in the monolayer competing directly with energy
transfer to silicon at close distances. We resolve these competing processes by studying the TRES spectra
and decompose them into their emission components. We found the energy transfer rate for the monomer
to silicon to be double than that of the dimer at a distance of d ~ 5 nm to the silicon surface. The
Förster radius for the energy transfer to silicon was estimated at 5.5 ± 0.5 nm.
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Published date: 26 April 2010
Organisations:
Engineering Mats & Surface Engineerg Gp
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Local EPrints ID: 146089
URI: http://eprints.soton.ac.uk/id/eprint/146089
ISSN: 0009-2614
PURE UUID: 8dc5c687-4bc4-4841-9c81-aa862a2fad3c
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Date deposited: 20 Apr 2010 14:47
Last modified: 14 Mar 2024 00:53
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Author:
Lefteris Danos
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