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Interfacial effects on the electrical properties of multiferroic BiFeO/Pt/Si thin film heterostructures

Interfacial effects on the electrical properties of multiferroic BiFeO/Pt/Si thin film heterostructures
Interfacial effects on the electrical properties of multiferroic BiFeO/Pt/Si thin film heterostructures
Polycrystalline BiFeO3 thin films of various thickness were fabricated on (111)Pt/Ti/SiO2/Si substrates via chemical solution deposition. The electrical properties were investigated using impedance and leakage current measurements. X-ray photoelectron spectroscopy (XPS) combined with Ar ion milling (depth profiling) was used to investigate elemental distribution near the electrode–film interface. It is shown that the dielectric constant depends on film thickness due to the presence of an interfacial film–electrode layer evidenced by XPS investigation. Direct current conductivity is found to be governed by Schottky and/or Poole-Frenkel mechanisms
0040-6090
24-29
Yakovlev, S.
115fb426-5f61-4383-8336-f83207f33b64
Zekonyte, J.
4a1b52a8-fa37-45d8-88d8-593df2efe662
Solterbeck, C. H.
a70f7591-9e55-4cd1-9a8c-acbad3bdfb0e
Es Souni, M.
60140fcf-c227-40a7-8182-1bbcb579b69a
Yakovlev, S.
115fb426-5f61-4383-8336-f83207f33b64
Zekonyte, J.
4a1b52a8-fa37-45d8-88d8-593df2efe662
Solterbeck, C. H.
a70f7591-9e55-4cd1-9a8c-acbad3bdfb0e
Es Souni, M.
60140fcf-c227-40a7-8182-1bbcb579b69a

Yakovlev, S., Zekonyte, J., Solterbeck, C. H. and Es Souni, M. (2005) Interfacial effects on the electrical properties of multiferroic BiFeO/Pt/Si thin film heterostructures. Thin Solid Films, 493 (1-2), 24-29. (doi:10.1016/j.tsf.2005.06.020).

Record type: Article

Abstract

Polycrystalline BiFeO3 thin films of various thickness were fabricated on (111)Pt/Ti/SiO2/Si substrates via chemical solution deposition. The electrical properties were investigated using impedance and leakage current measurements. X-ray photoelectron spectroscopy (XPS) combined with Ar ion milling (depth profiling) was used to investigate elemental distribution near the electrode–film interface. It is shown that the dielectric constant depends on film thickness due to the presence of an interfacial film–electrode layer evidenced by XPS investigation. Direct current conductivity is found to be governed by Schottky and/or Poole-Frenkel mechanisms

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Published date: December 2005

Identifiers

Local EPrints ID: 158481
URI: http://eprints.soton.ac.uk/id/eprint/158481
ISSN: 0040-6090
PURE UUID: 14b869e3-0e2e-4883-a571-7469bed7c4f1

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Date deposited: 02 Jul 2010 10:42
Last modified: 14 Mar 2024 01:50

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Contributors

Author: S. Yakovlev
Author: J. Zekonyte
Author: C. H. Solterbeck
Author: M. Es Souni

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