Etching rate and structural modification of polymer films during low energy ion irradiation

Zaporojtchenko, V., Zekonyte, J., Erichsen, J. and Faupel, F. (2003) Etching rate and structural modification of polymer films during low energy ion irradiation. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 208, 155-160. (doi:10.1016/S0168-583X(03)00625-6).

Abstract

Various polymers were sputtered with low energy Ar+ ions of 1 keV in order to determine their etching rate. Hydrocarbons, oxygenated, fluorinated and nitrogen-containing glassy polymers with a broad range of the glass transition temperature (Tg) were chosen. The etching rate was measured using a profilometer, and X-ray photoelectron spectroscopy. At the same time the surface chemical modification, and the surface glass transition temperature were studied. Comparing the sputter rate to the various polymer properties a correlation among the Tg, cross-link density, and sputter rate was found. In addition, the sputter rate as a function of the integral ion fluence proved to exhibit a sharp increase in the initial regime of very low fluence. The results are discussed in terms of the characteristics of the polymers

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