The University of Southampton
University of Southampton Institutional Repository

Ion track nanolithography using thick cross-linked poly(methyl methacrylate) 950 photoresist

Ion track nanolithography using thick cross-linked poly(methyl methacrylate) 950 photoresist
Ion track nanolithography using thick cross-linked poly(methyl methacrylate) 950 photoresist
This study shows that poly(methyl methacrylate) (PMMA) 950 thick photoresist is a promising polymer for ion-track nanolithography templates for nanomaterials fabrication resulting in high aspect ratio nanostructures ranging from 100 to 500 with highly selective etch rates when using deep ultraviolet (DUV) cross linking polymerisation prior to the ion-track irradiation. DUV exposure times and post exposure hardbake conditions are crucial factors for achieving high aspect ratio structures. Exposure doses of 6600 mJ/cm2 with post exposure hardbake at 180 °C for 90 s gave promising preliminary results for high aspect ratio nanotemplates using thick layer of PMMA 950 photoresist.
0021-4922
06GE07
Koukharenko, Elena
b34ae878-2776-4088-8880-5b2bd4f33ec3
Kuleshova, Jekaterina
95594d04-c0e8-4a1f-b5cf-b3f90b314dd6
Fowler, Marcel
6f1b0e31-adca-457a-a20d-9df732de1e6a
Kok, Stephen L.
4437f118-8205-460c-9017-411f46a3643b
Tudor, Michael J.
6bf979f1-0b7f-4d6a-b08b-a7f253a6b93d
Beeby, Stephen P.
bf6a44d4-1983-4b91-b6ef-a33a33410077
Nandhakumar, Iris
e9850fe5-1152-4df8-8a26-ed44b5564b04
White, Neil M.
ad637f36-434c-4657-a112-252be825d8a9
Koukharenko, Elena
b34ae878-2776-4088-8880-5b2bd4f33ec3
Kuleshova, Jekaterina
95594d04-c0e8-4a1f-b5cf-b3f90b314dd6
Fowler, Marcel
6f1b0e31-adca-457a-a20d-9df732de1e6a
Kok, Stephen L.
4437f118-8205-460c-9017-411f46a3643b
Tudor, Michael J.
6bf979f1-0b7f-4d6a-b08b-a7f253a6b93d
Beeby, Stephen P.
bf6a44d4-1983-4b91-b6ef-a33a33410077
Nandhakumar, Iris
e9850fe5-1152-4df8-8a26-ed44b5564b04
White, Neil M.
ad637f36-434c-4657-a112-252be825d8a9

Koukharenko, Elena, Kuleshova, Jekaterina, Fowler, Marcel, Kok, Stephen L., Tudor, Michael J., Beeby, Stephen P., Nandhakumar, Iris and White, Neil M. (2010) Ion track nanolithography using thick cross-linked poly(methyl methacrylate) 950 photoresist. Japanese Journal of Applied Physics, 49 (6), 06GE07. (doi:10.1143/JJAP.49.06GE07).

Record type: Article

Abstract

This study shows that poly(methyl methacrylate) (PMMA) 950 thick photoresist is a promising polymer for ion-track nanolithography templates for nanomaterials fabrication resulting in high aspect ratio nanostructures ranging from 100 to 500 with highly selective etch rates when using deep ultraviolet (DUV) cross linking polymerisation prior to the ion-track irradiation. DUV exposure times and post exposure hardbake conditions are crucial factors for achieving high aspect ratio structures. Exposure doses of 6600 mJ/cm2 with post exposure hardbake at 180 °C for 90 s gave promising preliminary results for high aspect ratio nanotemplates using thick layer of PMMA 950 photoresist.

Full text not available from this repository.

More information

Published date: 2010

Identifiers

Local EPrints ID: 158793
URI: http://eprints.soton.ac.uk/id/eprint/158793
ISSN: 0021-4922
PURE UUID: 27e52bc5-535e-4d3e-b306-df2431045137
ORCID for Iris Nandhakumar: ORCID iD orcid.org/0000-0002-9668-9126

Catalogue record

Date deposited: 23 Jun 2010 11:52
Last modified: 20 Jul 2019 01:13

Export record

Altmetrics

Contributors

Author: Elena Koukharenko
Author: Jekaterina Kuleshova
Author: Marcel Fowler
Author: Stephen L. Kok
Author: Michael J. Tudor
Author: Stephen P. Beeby
Author: Neil M. White

University divisions

Download statistics

Downloads from ePrints over the past year. Other digital versions may also be available to download e.g. from the publisher's website.

View more statistics

Atom RSS 1.0 RSS 2.0

Contact ePrints Soton: eprints@soton.ac.uk

ePrints Soton supports OAI 2.0 with a base URL of http://eprints.soton.ac.uk/cgi/oai2

This repository has been built using EPrints software, developed at the University of Southampton, but available to everyone to use.

We use cookies to ensure that we give you the best experience on our website. If you continue without changing your settings, we will assume that you are happy to receive cookies on the University of Southampton website.

×