Sub-micron period grating structures in Ta2O5 and InOx thin oxide films fabricated using 248nm interferometric excimer laser ablation
Sub-micron period grating structures in Ta2O5 and InOx thin oxide films fabricated using 248nm interferometric excimer laser ablation
High quality relief gratings of period 500nm have been patterned in InOx and Ta2O5 thin films using interferometric 248nm excimer laser ablation. Details of the ablation process and the morphology of the gratings are presented.
Pissadakis, S.
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Reekie, L.
ec314137-6924-44ad-86a4-ff3f9a67c1b5
Wilkinson, J.S.
73483cf3-d9f2-4688-9b09-1c84257884ca
Kiriakidis, G.
20ecc498-cfab-40d6-b506-10d4dba09422
2000
Pissadakis, S.
a91c54e0-3b8d-479f-b44e-e678bc34a277
Reekie, L.
ec314137-6924-44ad-86a4-ff3f9a67c1b5
Wilkinson, J.S.
73483cf3-d9f2-4688-9b09-1c84257884ca
Kiriakidis, G.
20ecc498-cfab-40d6-b506-10d4dba09422
Pissadakis, S., Reekie, L., Wilkinson, J.S. and Kiriakidis, G.
(2000)
Sub-micron period grating structures in Ta2O5 and InOx thin oxide films fabricated using 248nm interferometric excimer laser ablation.
CLEO/Europe 2000, Nice, France, Nice, France.
10 - 15 Sep 2000.
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Conference or Workshop Item
(Paper)
Abstract
High quality relief gratings of period 500nm have been patterned in InOx and Ta2O5 thin films using interferometric 248nm excimer laser ablation. Details of the ablation process and the morphology of the gratings are presented.
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Published date: 2000
Additional Information:
CWF50
Venue - Dates:
CLEO/Europe 2000, Nice, France, Nice, France, 2000-09-10 - 2000-09-15
Identifiers
Local EPrints ID: 16961
URI: http://eprints.soton.ac.uk/id/eprint/16961
PURE UUID: 5d423169-28ac-4216-94f4-eb87a9ff063d
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Date deposited: 22 Aug 2005
Last modified: 16 Mar 2024 02:33
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Contributors
Author:
S. Pissadakis
Author:
L. Reekie
Author:
G. Kiriakidis
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