Rapid heat treatment for photosensitivity locking in deuterium-loaded planar optical waveguides
Rapid heat treatment for photosensitivity locking in deuterium-loaded planar optical waveguides
Permanent deuterium enhanced photosensitivity is demonstrated-in Ge-doped silica-on-silicon thin film layers by applying a rapid thermal process. The long term photosensitivity locking obtained should enable the development of all UV-written devices limited to date by the rapid deuterium outdiffusion during fabrication.
Riziotis, C.
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Fu, A.
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Watts, S.P.
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Williams, R.
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Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
2001
Riziotis, C.
a2037f27-c711-46c3-bec4-2293fca6f0e0
Fu, A.
b5da22be-79a6-4c9c-af25-00c02bbace16
Watts, S.P.
aee81832-68b5-4260-8e93-90503cfce3af
Williams, R.
49181762-00c1-4043-9247-a9bcddbd04f7
Smith, P.G.R.
8979668a-8b7a-4838-9a74-1a7cfc6665f6
Riziotis, C., Fu, A., Watts, S.P., Williams, R. and Smith, P.G.R.
(2001)
Rapid heat treatment for photosensitivity locking in deuterium-loaded planar optical waveguides.
BGPP 2001: Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, Stresa, Italy.
04 - 06 Jul 2001.
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Conference or Workshop Item
(Paper)
Abstract
Permanent deuterium enhanced photosensitivity is demonstrated-in Ge-doped silica-on-silicon thin film layers by applying a rapid thermal process. The long term photosensitivity locking obtained should enable the development of all UV-written devices limited to date by the rapid deuterium outdiffusion during fabrication.
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Published date: 2001
Additional Information:
BThC31
Venue - Dates:
BGPP 2001: Bragg Gratings, Photosensitivity, and Poling in Glass Waveguides, Stresa, Italy, 2001-07-04 - 2001-07-06
Identifiers
Local EPrints ID: 17152
URI: http://eprints.soton.ac.uk/id/eprint/17152
PURE UUID: 6ce02cb2-9538-4e60-b406-0b6461243891
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Date deposited: 15 Sep 2005
Last modified: 16 Mar 2024 02:49
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Contributors
Author:
C. Riziotis
Author:
A. Fu
Author:
S.P. Watts
Author:
R. Williams
Author:
P.G.R. Smith
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