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High-pressure chemical deposition for void-free filling of extreme aspect ratio templates

High-pressure chemical deposition for void-free filling of extreme aspect ratio templates
High-pressure chemical deposition for void-free filling of extreme aspect ratio templates
Extreme aspect ratio semiconductor structures are critical to modern optoelectronic technology because of their ability to waveguide light and transport electrons. Waveguides formed from almost any material by conventional micro/nanofabrication techniques typically have signifi cant surface roughness that scatters light and is a constraining factor in most optoelectronic devices. For example, fabricated planar silica waveguides have optical losses 3 to 5 orders of magnitude higher than silica fi bers, in part due to surface roughness. For these reasons silica nanofi bers have been proposed as alternatives to fabricated silica or semiconductor channels for waveguiding of light in miniaturized optical devices, as they meet the strict requirements for surface roughness and diameter uniformity required for low loss. An additional advantage of these silica fi bers is that they have a circular cross section that can simultaneously guide both transverse electric (TE) and transverse magnetic (TM) polarizations without cutoff. In contrast the rectilinear cross sections of microfabricated planar waveguides can effectively guide only one polarization without cutoff. However, semiconductors in general exhibit a far broader range of useful optoelectronic function than silica glass because of their ability to form hetero and homojunctions, serve as optical gain media over a broad range of wavelengths, and their superior non-linear optical properties.
silicon, optical waveguides, high pressure deposition, templated growth, optical fibers
1521-4095
4605-4611
Baril, Neil F.
874307ff-dbed-4c25-91a5-49288b19be29
Keshavarzi, Banafsheh
66f02faf-bb7e-409a-914c-d6a9ec0fcc52
Sparks, Justin R.
68cb6a0c-29ef-4487-8940-557b05b08568
Krishnamurthi, Mahesh
f707c230-29e8-436d-a160-a54f41ae5305
Temnykh, Ivan
43667291-9147-438e-87bb-f7f37d199c0b
Sazio, Pier J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
Peacock, Anna C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Borhan, Ali
3dddba0a-7321-49a1-b7e4-a37bad807ba0
Gopalan, Venkatraman
c37ec093-614a-4b1c-a6ec-a5b32f398a58
Badding, John V.
dd484978-a8b8-4d1f-9b9e-b6b33bde9e7b
Baril, Neil F.
874307ff-dbed-4c25-91a5-49288b19be29
Keshavarzi, Banafsheh
66f02faf-bb7e-409a-914c-d6a9ec0fcc52
Sparks, Justin R.
68cb6a0c-29ef-4487-8940-557b05b08568
Krishnamurthi, Mahesh
f707c230-29e8-436d-a160-a54f41ae5305
Temnykh, Ivan
43667291-9147-438e-87bb-f7f37d199c0b
Sazio, Pier J.A.
0d6200b5-9947-469a-8e97-9147da8a7158
Peacock, Anna C.
685d924c-ef6b-401b-a0bd-acf1f8e758fc
Borhan, Ali
3dddba0a-7321-49a1-b7e4-a37bad807ba0
Gopalan, Venkatraman
c37ec093-614a-4b1c-a6ec-a5b32f398a58
Badding, John V.
dd484978-a8b8-4d1f-9b9e-b6b33bde9e7b

Baril, Neil F., Keshavarzi, Banafsheh, Sparks, Justin R., Krishnamurthi, Mahesh, Temnykh, Ivan, Sazio, Pier J.A., Peacock, Anna C., Borhan, Ali, Gopalan, Venkatraman and Badding, John V. (2010) High-pressure chemical deposition for void-free filling of extreme aspect ratio templates Advanced Materials, 22, (41), pp. 4605-4611. (doi:10.1002/adma.201001199). (PMID:20827671).

Record type: Article

Abstract

Extreme aspect ratio semiconductor structures are critical to modern optoelectronic technology because of their ability to waveguide light and transport electrons. Waveguides formed from almost any material by conventional micro/nanofabrication techniques typically have signifi cant surface roughness that scatters light and is a constraining factor in most optoelectronic devices. For example, fabricated planar silica waveguides have optical losses 3 to 5 orders of magnitude higher than silica fi bers, in part due to surface roughness. For these reasons silica nanofi bers have been proposed as alternatives to fabricated silica or semiconductor channels for waveguiding of light in miniaturized optical devices, as they meet the strict requirements for surface roughness and diameter uniformity required for low loss. An additional advantage of these silica fi bers is that they have a circular cross section that can simultaneously guide both transverse electric (TE) and transverse magnetic (TM) polarizations without cutoff. In contrast the rectilinear cross sections of microfabricated planar waveguides can effectively guide only one polarization without cutoff. However, semiconductors in general exhibit a far broader range of useful optoelectronic function than silica glass because of their ability to form hetero and homojunctions, serve as optical gain media over a broad range of wavelengths, and their superior non-linear optical properties.

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More information

Published date: 2 November 2010
Keywords: silicon, optical waveguides, high pressure deposition, templated growth, optical fibers

Identifiers

Local EPrints ID: 177049
URI: http://eprints.soton.ac.uk/id/eprint/177049
ISSN: 1521-4095
PURE UUID: ff2a92f4-f710-4e43-9b82-7cc9aa61d616
ORCID for Pier J.A. Sazio: ORCID iD orcid.org/0000-0002-6506-9266
ORCID for Anna C. Peacock: ORCID iD orcid.org/0000-0002-1940-7172

Catalogue record

Date deposited: 15 Mar 2011 09:15
Last modified: 18 Jul 2017 12:06

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Contributors

Author: Neil F. Baril
Author: Banafsheh Keshavarzi
Author: Justin R. Sparks
Author: Mahesh Krishnamurthi
Author: Ivan Temnykh
Author: Pier J.A. Sazio ORCID iD
Author: Anna C. Peacock ORCID iD
Author: Ali Borhan
Author: Venkatraman Gopalan
Author: John V. Badding

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