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Three-dimensional random walk simulation of diffusion controlled electrode processes: (II) Arrays of growing hemispheres

Three-dimensional random walk simulation of diffusion controlled electrode processes: (II) Arrays of growing hemispheres
Three-dimensional random walk simulation of diffusion controlled electrode processes: (II) Arrays of growing hemispheres
A series of random walk simulations of diffusion controlled electrodeposition processes following instantaneous nucleation were performed to predict chronoamperometric current transients. At short times the current increases due to the growth of individual deposits, while at long times the current drops under the control of linear diffusion towards the surface. The current transient exhibits a maximum at intermediate times soon after the diffusion zones of the growing centres overlap. Relating the positions and heights of the peaks to simulation parameters we found that, apart from the chemical characteristics of the system, the current depends only on bulk concentration and nuclear number density. After rescaling the current transients according to these relations we were able to derive a simple analytical expression that characterises the whole process with sufficient accuracy. Comparing our results with existing analytical theories, we found certain conditions when they agree with our simulations. In this way, we were able to define the concentration range where these theories work satisfactorily.
random walk simulation, electrodeposition precesses, chronoamperometric current transients, simulation parametersgrowth, nucleation, models
1572-6657
175-180
Nagy, Gabor
023ee1ff-4664-4b7c-a429-6b4dec152e92
Denuault, Guy
5c76e69f-e04e-4be5-83c5-e729887ffd4e
Nagy, Gabor
023ee1ff-4664-4b7c-a429-6b4dec152e92
Denuault, Guy
5c76e69f-e04e-4be5-83c5-e729887ffd4e

Nagy, Gabor and Denuault, Guy (1997) Three-dimensional random walk simulation of diffusion controlled electrode processes: (II) Arrays of growing hemispheres. Journal of Electroanalytical Chemistry, 433 (1-2), 175-180. (doi:10.1016/S0022-0728(97)00286-6).

Record type: Article

Abstract

A series of random walk simulations of diffusion controlled electrodeposition processes following instantaneous nucleation were performed to predict chronoamperometric current transients. At short times the current increases due to the growth of individual deposits, while at long times the current drops under the control of linear diffusion towards the surface. The current transient exhibits a maximum at intermediate times soon after the diffusion zones of the growing centres overlap. Relating the positions and heights of the peaks to simulation parameters we found that, apart from the chemical characteristics of the system, the current depends only on bulk concentration and nuclear number density. After rescaling the current transients according to these relations we were able to derive a simple analytical expression that characterises the whole process with sufficient accuracy. Comparing our results with existing analytical theories, we found certain conditions when they agree with our simulations. In this way, we were able to define the concentration range where these theories work satisfactorily.

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More information

Published date: 15 August 1997
Additional Information: YJ743
Keywords: random walk simulation, electrodeposition precesses, chronoamperometric current transients, simulation parametersgrowth, nucleation, models

Identifiers

Local EPrints ID: 179251
URI: http://eprints.soton.ac.uk/id/eprint/179251
ISSN: 1572-6657
PURE UUID: 939e8f9b-0f3d-4e66-9d68-e036b4d17852
ORCID for Guy Denuault: ORCID iD orcid.org/0000-0002-8630-9492

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Date deposited: 01 Apr 2011 09:21
Last modified: 15 Mar 2024 02:44

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Contributors

Author: Gabor Nagy
Author: Guy Denuault ORCID iD

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