Photolysis of (Me2Si)(6) in argon matrices doped with high concentrations (ca. 20%) of N2O or C2H4O: formation of (Me2SiO)(6)
Photolysis of (Me2Si)(6) in argon matrices doped with high concentrations (ca. 20%) of N2O or C2H4O: formation of (Me2SiO)(6)
Irradiation using a low pressure mercury lamp (lambda =ca. 250 nm) of argon matrices containing ca. 1% (Me2Si)(6) and ca. 20% ethylene oxide (C2H4O) or nitrous oxide (N2O) for a period of ca. 20 h leads to the formation of the cyclic compound (Me2SiO)(6). This has a 12-membered ring with alternating Si and O atoms. It is identified by comparison of its infrared spectrum with a spectrum of an authentic sample. The reaction appears to proceed by stepwise insertion of O atoms into Si-Si bonds.
photolysis, matrix isolation, (me2si)(6), oxidation
isolated dimethylsilylene, dodecamethylcyclohexasilane, photooxidation, 1-methylsilene
177-181
Almond, M. J.
72d3a88a-d7b7-48d0-b40e-62e36a70bbea
Cannady, J. P.
88d90324-8fd1-4b5b-870a-7fba9d16afd3
Darling, T. A.
29a1a4b2-c850-4636-a68b-6b7646e425dc
Ogden, J. S.
82db5ee4-1836-4d04-a8ed-281016b93eee
Walsh, R.
f12c0287-3dec-4bde-9917-9cfdd6aae947
21 December 2001
Almond, M. J.
72d3a88a-d7b7-48d0-b40e-62e36a70bbea
Cannady, J. P.
88d90324-8fd1-4b5b-870a-7fba9d16afd3
Darling, T. A.
29a1a4b2-c850-4636-a68b-6b7646e425dc
Ogden, J. S.
82db5ee4-1836-4d04-a8ed-281016b93eee
Walsh, R.
f12c0287-3dec-4bde-9917-9cfdd6aae947
Almond, M. J., Cannady, J. P., Darling, T. A., Ogden, J. S. and Walsh, R.
(2001)
Photolysis of (Me2Si)(6) in argon matrices doped with high concentrations (ca. 20%) of N2O or C2H4O: formation of (Me2SiO)(6).
Journal of Organometallic Chemistry, 640 (1-2), .
(doi:10.1016/S0022-328X(01)01184-6).
Abstract
Irradiation using a low pressure mercury lamp (lambda =ca. 250 nm) of argon matrices containing ca. 1% (Me2Si)(6) and ca. 20% ethylene oxide (C2H4O) or nitrous oxide (N2O) for a period of ca. 20 h leads to the formation of the cyclic compound (Me2SiO)(6). This has a 12-membered ring with alternating Si and O atoms. It is identified by comparison of its infrared spectrum with a spectrum of an authentic sample. The reaction appears to proceed by stepwise insertion of O atoms into Si-Si bonds.
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Published date: 21 December 2001
Keywords:
photolysis, matrix isolation, (me2si)(6), oxidation
isolated dimethylsilylene, dodecamethylcyclohexasilane, photooxidation, 1-methylsilene
Identifiers
Local EPrints ID: 19378
URI: http://eprints.soton.ac.uk/id/eprint/19378
ISSN: 0022-328X
PURE UUID: 364b6f0c-8db0-496f-bfb3-31f2e7eea632
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Date deposited: 13 Feb 2006
Last modified: 15 Mar 2024 06:15
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Contributors
Author:
M. J. Almond
Author:
J. P. Cannady
Author:
T. A. Darling
Author:
J. S. Ogden
Author:
R. Walsh
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