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Photolysis of (Me2Si)(6) in argon matrices doped with high concentrations (ca. 20%) of N2O or C2H4O: formation of (Me2SiO)(6)

Almond, M. J., Cannady, J. P., Darling, T. A., Ogden, J. S. and Walsh, R. (2001) Photolysis of (Me2Si)(6) in argon matrices doped with high concentrations (ca. 20%) of N2O or C2H4O: formation of (Me2SiO)(6) Journal of Organometallic Chemistry, 640, (1-2), pp. 177-181.

Record type: Article


Irradiation using a low pressure mercury lamp (lambda =ca. 250 nm) of argon matrices containing ca. 1% (Me2Si)(6) and ca. 20% ethylene oxide (C2H4O) or nitrous oxide (N2O) for a period of ca. 20 h leads to the formation of the cyclic compound (Me2SiO)(6). This has a 12-membered ring with alternating Si and O atoms. It is identified by comparison of its infrared spectrum with a spectrum of an authentic sample. The reaction appears to proceed by stepwise insertion of O atoms into Si-Si bonds.

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Published date: 21 December 2001
Keywords: photolysis, matrix isolation, (me2si)(6), oxidation isolated dimethylsilylene, dodecamethylcyclohexasilane, photooxidation, 1-methylsilene


Local EPrints ID: 19378
ISSN: 0022-328X
PURE UUID: 364b6f0c-8db0-496f-bfb3-31f2e7eea632

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Date deposited: 13 Feb 2006
Last modified: 11 Aug 2017 13:06

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Author: M. J. Almond
Author: J. P. Cannady
Author: T. A. Darling
Author: J. S. Ogden
Author: R. Walsh

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