Differential etch rates in z-cut LiNbO3 for variable HF/HNO3 concentrations
Differential etch rates in z-cut LiNbO3 for variable HF/HNO3 concentrations
We report the experimental measurements for etch rates of the +z and -z faces of single crystal lithium niobate immersed in HF and HNO3 acid mixtures of varying ratios. We find that pure HF produces an etch rate that is a factor of 2 higher than the rate obtained for the more frequently used mixture of HF/HNO3 in a 1:2 ratio. We further observe that the quality of etching is improved for either pure HF or HF/HNO3 in a 1:4 ratio, again by comparison with use of a 1 : 2 ratio. These results lead to a discussion of the etch chemistry involved, and an explanation for the observed high degree of differential etching between the +z and -z crystal faces.
domain-structures, lithium, inversion, crystals, field
295-298
Sones, Collin L.
9de9d8ee-d394-46a5-80b7-e341c0eed0a8
Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Brocklesby, William S.
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Eason, Robert W.
e38684c3-d18c-41b9-a4aa-def67283b020
Owen, John R.
067986ea-f3f3-4a83-bc87-7387cc5ac85d
2002
Sones, Collin L.
9de9d8ee-d394-46a5-80b7-e341c0eed0a8
Mailis, Sakellaris
233e0768-3f8d-430e-8fdf-92e6f4f6a0c4
Brocklesby, William S.
c53ca2f6-db65-4e19-ad00-eebeb2e6de67
Eason, Robert W.
e38684c3-d18c-41b9-a4aa-def67283b020
Owen, John R.
067986ea-f3f3-4a83-bc87-7387cc5ac85d
Sones, Collin L., Mailis, Sakellaris, Brocklesby, William S., Eason, Robert W. and Owen, John R.
(2002)
Differential etch rates in z-cut LiNbO3 for variable HF/HNO3 concentrations.
Journal of Materials Chemistry, 12 (2), .
(doi:10.1039/b106279b).
Abstract
We report the experimental measurements for etch rates of the +z and -z faces of single crystal lithium niobate immersed in HF and HNO3 acid mixtures of varying ratios. We find that pure HF produces an etch rate that is a factor of 2 higher than the rate obtained for the more frequently used mixture of HF/HNO3 in a 1:2 ratio. We further observe that the quality of etching is improved for either pure HF or HF/HNO3 in a 1:4 ratio, again by comparison with use of a 1 : 2 ratio. These results lead to a discussion of the etch chemistry involved, and an explanation for the observed high degree of differential etching between the +z and -z crystal faces.
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Published date: 2002
Keywords:
domain-structures, lithium, inversion, crystals, field
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Local EPrints ID: 19861
URI: http://eprints.soton.ac.uk/id/eprint/19861
PURE UUID: 7f2c08d0-fa76-4d77-b0ac-cc61f6cb5061
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Date deposited: 22 Feb 2006
Last modified: 16 Mar 2024 02:43
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Author:
Collin L. Sones
Author:
Sakellaris Mailis
Author:
Robert W. Eason
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