Sones, Collin L., Mailis, Sakellaris, Brocklesby, William S., Eason, Robert W. and Owen, John R. (2002) Differential etch rates in z-cut LiNbO3 for variable HF/HNO3 concentrations. Journal of Materials Chemistry, 12 (2), 295-298. (doi:10.1039/b106279b).
Abstract
We report the experimental measurements for etch rates of the +z and -z faces of single crystal lithium niobate immersed in HF and HNO3 acid mixtures of varying ratios. We find that pure HF produces an etch rate that is a factor of 2 higher than the rate obtained for the more frequently used mixture of HF/HNO3 in a 1 : 2 ratio. We further observe that the quality of etching is improved for either pure HF or HF/HNO3 in a 1 : 4 ratio, again by comparison with use of a 1 : 2 ratio. These results lead to a discussion of the etch chemistry involved, and an explanation for the observed high degree of differential etching between the +z and -z crystal faces.
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- Faculties (pre 2011 reorg) > Faculty of Engineering Science & Maths (pre 2011 reorg) > Optoelectronics Research Centre (pre 2011 reorg)
Current Faculties > Faculty of Engineering and Physical Sciences > Zepler Institute for Photonics and Nanoelectronics > Optoelectronics Research Centre (pre 2011 reorg)
Zepler Institute for Photonics and Nanoelectronics > Optoelectronics Research Centre (pre 2011 reorg) - Faculties (pre 2011 reorg) > Faculty of Engineering Science & Maths (pre 2011 reorg) > Chemistry (pre 2011 reorg)
Current Faculties > Faculty of Engineering and Physical Sciences > School of Chemistry > Chemistry (pre 2011 reorg)
School of Chemistry > Chemistry (pre 2011 reorg)
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